Inventor
YOSHITAKE SHUSUKE
JP17 patents
⚠️ This page may combine multiple inventors who share the name “YOSHITAKE SHUSUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
9 patentsUS6281510B1Aug 28, 2001
Sample transferring method and sample transfer supporting apparatus
TOSHIBA KK52 citations95
US6090176AJul 18, 2000
Sample transferring method and sample transfer supporting apparatus
TOSHIBA KK62 citations95
US6172364B1Jan 9, 2001
Charged particle beam irradiation apparatus
TOSHIBA KK31 citations92
US5909030AJun 1, 1999
Pattern transfer apparatus, an operation management system thereof, and an operation management system for a semiconductor manufacture apparatus
TOSHIBA KK45 citations92
US5912468AJun 15, 1999
Charged particle beam exposure system
TOSHIBA KK22 citations91
US5929452AJul 27, 1999
Electrostatic deflecting electrode unit for use in charged beam lithography apparatus and method of manufacture the same
TOSHIBA KK17 citations81
US6676289B2Jan 13, 2004
Temperature measuring method in pattern drawing apparatus
TOSHIBA KK10 citations73
US6182369B1Feb 6, 2001
Pattern forming apparatus
TOSHIBA KK10 citations73
US5850083ADec 15, 1998
Charged particle beam lithograph apparatus
TOSHIBA KK12 citations73
NUFLARE TECHNOLOGY INC
4 patentsUS7643130B2Jan 5, 2010
Position measuring apparatus and positional deviation measuring method
NUFLARE TECHNOLOGY INC19 citations84
US7554107B2Jun 30, 2009
Writing method and writing apparatus of charged particle beam, positional deviation measuring method, and position measuring apparatus
NUFLARE TECHNOLOGY INC10 citations84
US10572990B2Feb 25, 2020
Pattern inspection apparatus, pattern position measurement apparatus, aerial image measurement system, method for measuring aerial image, pattern position repairing apparatus, method for repairing pattern position, aerial image data processing apparatus, method for processing aerial image data, pattern exposure apparatus, method for exposing pattern, method for manufacturing mask, and mask manufacturing system
NUFLARE TECHNOLOGY INC2 citations67
US11475557B2Oct 18, 2022
Mask inspection apparatus, electron beam inspection apparatus, mask inspection method, and electron beam inspection method
NUFLARE TECHNOLOGY INC0 citations51
YOSHITAKE SHUSUKE
3 patentsUS8399833B2Mar 19, 2013
Charged particle beam writing method, method for detecting position of reference mark for charged particle beam writing, and charged particle beam writing apparatus
YOSHITAKE SHUSUKE5 citations70
US9552963B2Jan 24, 2017
Charged particle beam writing apparatus and method therefor
YOSHITAKE SHUSUKE0 citations39
US8718972B2May 6, 2014
Electron beam writing apparatus and position displacement amount correcting method
YOSHITAKE SHUSUKE0 citations39