Inventor

CHOI SANG-JUN

KR130 patents

⚠️ This page may combine multiple inventors who share the name “CHOI SANG-JUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHOI SANG-JUN

SAMSUNG ELECTRONICS CO LTD

Methods for forming line patterns in semiconductor substrates

Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same

Photosensitive polymer, dissolution inhibitor and chemically amplified photoresist composition containing the same

PAA-based etchant, methods of using same, and resultant structures

Photosensitive polymer having cyclic backbone and resist composition containing the same

Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist composition comprising the same

Methods for forming line patterns in semiconductor substrates

Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same

Resist composition comprising photosensitive polymer having loctone in its backbone

Photosensitive polymer and chemically amplified photoresist composition containing the same

Photosensitive polymers and photoresist compositions containing the same

PAA-based etchant, methods of using same, and resultant structures

Resistive RAM having at least one varistor and methods of operating the same

Photosensitive polymer having fused aromatic ring and photoresist composition containing the same

Dissolution inhibitor of chemically amplified photoresist and chemically amplified photoresist composition containing the same

Chemically amplified photoresist composition

Polymer for photoresist, photoresist composition containing the same, and preparation method thereof

Resist compositions for chemically amplified resists comprising a di(t-butyl)malonyl methyl side group in the base polymer

Method for manufacturing a photoresist pattern defining a small opening and method for manufacturing semiconductor device using the same

Photosensitive polymers and chemically amplified photoresist compositions using the same

Chemically amplified resist polymers

Cleaning solution and cleaning method of a semiconductor device

Cleaning solution and cleaning method of a semiconductor device

Phase change memory device and method of operating the same

Cleaning solution and cleaning method of a semiconductor device

Semiconductor capacitor structure and method for manufacturing the same

Photosensitive polymers containing adamantylalkyl vinyl ether, and resist compositions including the same

Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same

Photosensitive polymer having cyclic backbone and resist composition comprising the same

Photosensitive polymer having cyclic backbone and resist composition comprising same

Resist composition containing dialkyl malonate in base polymer

Polymer mixture for photoresist and photoresist composition containing the same

Photosensitive polymer having cyclic backbone and resist composition comprising the same

Resins for use in chemically amplified resists and manufacturing methods thereof

Photosensitive polymer

Chemically amplified resist composition

Chemically amplified resist compositions

Chemically amplified resist composition

Silicon containing polymer and chemically amplified resist composition comprising the same

Conductive carbon nanotube tip, probe having the conductive carbon nanotube tip, and method of manufacturing the conductive carbon nanotube tip

Chemically amplified resists

APPLIED MATERIALS INC

Device fabrication via pulsed plasma

Device fabrication via pulsed plasma

High lateral to vertical ratio etch process for device manufacturing

CHOI SANG JUN

Anti-reflective hardmask composition

Composition of anti-reflective hardmask

LG ELECTRONICS INC

Apparatus and method for processing AAL2 which supports multiple virtual channels in mobile communication system

CHOI SANG-JUN

Image sensors and methods of manufacturing image sensors

KIM JIN SUB

Image projecting apparatus

HYUNDAI ELECTRONICS IND

Method for forming wiring in semiconductor device