Inventor
SEIJO MA FATIMA
US11 patents
⚠️ This page may combine multiple inventors who share the name “SEIJO MA FATIMA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED TECH MATERIALS
10 patentsUS6896826B2May 24, 2005
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
ADVANCED TECH MATERIALS74 citations97
US6773873B2Aug 10, 2004
pH buffered compositions useful for cleaning residue from semiconductor substrates
ADVANCED TECH MATERIALS115 citations97
US6755989B2Jun 29, 2004
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
ADVANCED TECH MATERIALS43 citations96
US6344432B1Feb 5, 2002
Formulations including a 1,3-dicarbonyl compound chelating agent and copper corrosion inhibiting agents for stripping residues from semiconductor substrates containing copper structures
ADVANCED TECH MATERIALS51 citations96
US6967169B2Nov 22, 2005
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
ADVANCED TECH MATERIALS16 citations92
US6566315B2May 20, 2003
Formulations including a 1,3-dicarbonyl compound chelating agent and copper corrosion inhibiting agents for stripping residues from semiconductor substrates containing copper structures
ADVANCED TECH MATERIALS50 citations89
US7534752B2May 19, 2009
Post plasma ashing wafer cleaning formulation
ADVANCED TECH MATERIALS23 citations87
US7605113B2Oct 20, 2009
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
ADVANCED TECH MATERIALS11 citations84
US7662762B2Feb 16, 2010
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrates
ADVANCED TECH MATERIALS4 citations62
US9109188B2Aug 18, 2015
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
ADVANCED TECH MATERIALS0 citations52