Inventor

WU YUAN-HSUN

TW20 patents

⚠️ This page may combine multiple inventors who share the name “WU YUAN-HSUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WU YUAN-HSUN

NANYA TECHNOLOGY CORP

Phase-shifting mask for equal line/space dense line patterns

Method for optimizing NILS of exposed lines

Alignment mark and alignment method for the fabrication of trench-capacitor dram devices

Photolithography method for reducing effects of lens aberration

Mask and method for defining a guard ring pattern

Aperture plate for lithography systems

Best focus determining method

Masks and method for contact hole exposure

Chromeless phase-shifting mask for equal line/space dense line patterns

Test ket layout for precisely monitoring 3-foil lens aberration effects

Method of preventing repeated collapse in a reworked photoresist layer

Method for estimating repair accuracy of a mask shop

Pattern design method for lithography C/H process

Method for estimating repair accuracy of a mask shop

Phase-shift mask and method for forming a pattern

Method of forming a vertical memory device with a rectangular trench

Method of forming patterned photoresist layer

Alignment mark and method of manufacturing the same

QIMONDA AG

Method of double patterning, method of processing a plurality of semiconductor wafers and semiconductor device

CHIANG CHEN KU

Alignment mark and method of manufacturing the same