Inventor
BROWN DANIEL J W
US48 patents
⚠️ This page may combine multiple inventors who share the name “BROWN DANIEL J W”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CYMER INC
30 patentsUS6567450B2May 20, 2003
Very narrow band, two chamber, high rep rate gas discharge laser system
CYMER INC265 citations99
US6625191B2Sep 23, 2003
Very narrow band, two chamber, high rep rate gas discharge laser system
CYMER INC236 citations98
US6538737B2Mar 25, 2003
High resolution etalon-grating spectrometer
CYMER INC109 citations98
US6532247B2Mar 11, 2003
Laser wavelength control unit with piezoelectric driver
CYMER INC79 citations97
US7317196B2Jan 8, 2008
LPP EUV light source
CYMER INC54 citations96
US7154928B2Dec 26, 2006
Laser output beam wavefront splitter for bandwidth spectrum control
CYMER INC62 citations96
US7920616B2Apr 5, 2011
Laser system
CYMER INC32 citations93
US7822092B2Oct 26, 2010
Laser system
CYMER INC37 citations93
US7715459B2May 11, 2010
Laser system
CYMER INC36 citations93
US7643529B2Jan 5, 2010
Laser system
CYMER INC35 citations93
US7630424B2Dec 8, 2009
Laser system
CYMER INC24 citations93
US8680495B1Mar 25, 2014
Extreme ultraviolet light source
CYMER INC17 citations92
US7885309B2Feb 8, 2011
Laser system
CYMER INC37 citations92
US7567607B2Jul 28, 2009
Very narrow band, two chamber, high rep-rate gas discharge laser system
CYMER INC14 citations92
US7088758B2Aug 8, 2006
Relax gas discharge laser lithography light source
CYMER INC33 citations92
US6985508B2Jan 10, 2006
Very narrow band, two chamber, high reprate gas discharge laser system
CYMER INC29 citations92
US6801560B2Oct 5, 2004
Line selected F2 two chamber laser system
CYMER INC18 citations92
US6704340B2Mar 9, 2004
Lithography laser system with in-place alignment tool
CYMER INC53 citations92
US8791440B1Jul 29, 2014
Target for extreme ultraviolet light source
CYMER INC25 citations91
US7999915B2Aug 16, 2011
Laser system
CYMER INC15 citations84
US7830934B2Nov 9, 2010
Multi-chamber gas discharge laser bandwidth control through discharge timing
CYMER INC13 citations84
US7778302B2Aug 17, 2010
Laser system
CYMER INC15 citations84
US8014432B2Sep 6, 2011
Regenerative ring resonator
CYMER INC12 citations83
US7746913B2Jun 29, 2010
Laser system
CYMER INC7 citations74
US7058107B2Jun 6, 2006
Line selected F2 two chamber laser system
CYMER INC5 citations74
US6713770B2Mar 30, 2004
High resolution spectral measurement device
CYMER INC8 citations74
US7061961B2Jun 13, 2006
Very narrow band, two chamber, high rep-rate gas discharge laser system
CYMER INC5 citations73
US7218661B2May 15, 2007
Line selected F2 two chamber laser system
CYMER INC4 citations62
US7643528B2Jan 5, 2010
Immersion lithography laser light source with pulse stretcher
CYMER INC6 citations57
US7995637B2Aug 9, 2011
Gas discharge laser chamber
CYMER INC1 citations48
ASML NETHERLANDS BV
6 patentsUS9380691B2Jun 28, 2016
Adaptive laser system for an extreme ultraviolet light source
ASML NETHERLANDS BV7 citations82
US8866110B2Oct 21, 2014
Extreme ultraviolet light source
ASML NETHERLANDS BV5 citations73
US9338870B2May 10, 2016
Extreme ultraviolet light source
ASML NETHERLANDS BV3 citations72
US10966308B2Mar 30, 2021
EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
ASML NETHERLANDS BV0 citations52
US9155179B2Oct 6, 2015
Target for extreme ultraviolet light source
ASML NETHERLANDS BV0 citations51
US8912514B2Dec 16, 2014
Target for extreme ultraviolet light source
ASML NETHERLANDS BV0 citations51
Cymer LLC
3 patentsUS9390827B2Jul 12, 2016
EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
Cymer LLC7 citations84
US8958143B2Feb 17, 2015
Master oscillator—power amplifier drive laser with pre-pulse for EUV light source
Cymer LLC8 citations84
USRE45957EMar 29, 2016
Regenerative ring resonator
Cymer LLC4 citations73