Inventor
BESAUCELE HERVE A
US21 patents
Patents
21 patentsUS6567450B2May 20, 2003
Very narrow band, two chamber, high rep rate gas discharge laser system
CYMER INC265 citations99
US6128323AOct 3, 2000
Reliable modular production quality narrow-band high REP rate excimer laser
CYMER INC284 citations99
US6625191B2Sep 23, 2003
Very narrow band, two chamber, high rep rate gas discharge laser system
CYMER INC236 citations98
US6018537AJan 25, 2000
Reliable, modular, production quality narrow-band high rep rate F2 laser
CYMER INC280 citations98
US5991324ANov 23, 1999
Reliable. modular, production quality narrow-band KRF excimer laser
CYMER INC196 citations98
US6330261B1Dec 11, 2001
Reliable, modular, production quality narrow-band high rep rate ArF excimer laser
CYMER INC105 citations97
US6188710B1Feb 13, 2001
Narrow band gas discharge laser with gas additive
CYMER INC82 citations96
US6067306AMay 23, 2000
Laser-illuminated stepper or scanner with energy sensor feedback
CYMER INC84 citations96
US5978405ANov 2, 1999
Laser chamber with minimized acoustic and shock wave disturbances
CYMER INC68 citations95
US7567607B2Jul 28, 2009
Very narrow band, two chamber, high rep-rate gas discharge laser system
CYMER INC14 citations92
US6985508B2Jan 10, 2006
Very narrow band, two chamber, high reprate gas discharge laser system
CYMER INC29 citations92
US6801560B2Oct 5, 2004
Line selected F2 two chamber laser system
CYMER INC18 citations92
US6553049B1Apr 22, 2003
ArF laser with low pulse energy and high rep rate
CYMER INC22 citations92
USRE38054EApr 1, 2003
Reliable, modular, production quality narrow-band high rep rate F2 laser
CYMER INC42 citations92
US6704339B2Mar 9, 2004
Lithography laser with beam delivery and beam pointing control
CYMER INC50 citations91
US7741639B2Jun 22, 2010
Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control
CYMER INC12 citations82
US7835414B2Nov 16, 2010
Laser gas injection system
CYMER INC13 citations81
US7058107B2Jun 6, 2006
Line selected F2 two chamber laser system
CYMER INC5 citations74
US7061961B2Jun 13, 2006
Very narrow band, two chamber, high rep-rate gas discharge laser system
CYMER INC5 citations73
US7218661B2May 15, 2007
Line selected F2 two chamber laser system
CYMER INC4 citations62
US7471708B2Dec 30, 2008
Gas discharge laser output light beam parameter control
CYMER INC6 citations61