Inventor

SANDSTROM RICHARD L

US124 patents

⚠️ This page may combine multiple inventors who share the name “SANDSTROM RICHARD L”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SANDSTROM RICHARD L

CYMER INC

Very narrow band, two chamber, high rep rate gas discharge laser system

Injection seeded laser with precise timing control

Reliable modular production quality narrow-band high REP rate excimer laser

Magnetic modulator voltage and temperature timing compensation circuit

Wavelength system for an excimer laser

Pulse laser with pulse energy trimmer

Control system for a two chamber gas discharge laser

Very narrow band, two chamber, high rep rate gas discharge laser system

High resolution etalon-grating spectrometer

Injection seeded F2 lithography laser

Fluorine control system with fluorine monitor

Reliable, modular, production quality narrow-band high rep rate F2 laser

Reliable. modular, production quality narrow-band KRF excimer laser

High repetition rate laser produced plasma EUV light source

Four KHz gas discharge laser

Bandwidth control technique for a laser

Laser spectral engineering for lithographic process

Plasma focus light source with tandem ellipsoidal mirror units

Laser wavelength control unit with piezoelectric driver

Fast wavelength correction technique for a laser

Reliable, modular, production quality narrow-band high rep rate ArF excimer laser

Wavelength shift correction technique for a laser

Wavelength reference for excimer laser

High repetition rate laser produced plasma EUV light source

Laser output beam wavefront splitter for bandwidth spectrum control

Plasma focus light source with active and buffer gas control

Laser-illuminated stepper or scanner with energy sensor feedback

Pulse energy control for excimer laser

High voltage cable interlock circuit

High power deep ultraviolet laser with long life optics

Laser lithography light source with beam delivery

Injection seeded F2 laser with line selection and discrimination

Extreme repetition rate gas discharge laser

Excimer laser with greater spectral bandwidth and beam stability

Gas discharge ultraviolet wavemeter with enhanced illumination

Method and apparatus for eliminating reflected energy due to stage mismatch in nonlinear magnetic compression modules

Laser system

Laser system

Laser system

Long life fused silica ultraviolet optical elements

CYMER LASER TECH

Spectral narrowing technique

System for, and method of, regulating the wavelength of a light beam

Gas replenishment method and apparatus for excimer lasers

Compact excimer laser

Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser

Temperature compensation method and apparatus for wave meters and tunable lasers controlled thereby

VASCHENKO GEORGIY O

Laser produced plasma EUV light source

System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber

(unassigned)

Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window

PARTLO WILLIAM N

EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods