Inventor
NESS RICHARD M
US46 patents
⚠️ This page may combine multiple inventors who share the name “NESS RICHARD M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CYMER INC
45 patentsUS6566667B1May 20, 2003
Plasma focus light source with improved pulse power system
CYMER INC185 citations99
US6567450B2May 20, 2003
Very narrow band, two chamber, high rep rate gas discharge laser system
CYMER INC265 citations99
US6549551B2Apr 15, 2003
Injection seeded laser with precise timing control
CYMER INC186 citations99
US6128323AOct 3, 2000
Reliable modular production quality narrow-band high REP rate excimer laser
CYMER INC284 citations99
US6016325AJan 18, 2000
Magnetic modulator voltage and temperature timing compensation circuit
CYMER INC179 citations99
US6744060B2Jun 1, 2004
Pulse power system for extreme ultraviolet and x-ray sources
CYMER INC79 citations98
US6690704B2Feb 10, 2004
Control system for a two chamber gas discharge laser
CYMER INC128 citations98
US6625191B2Sep 23, 2003
Very narrow band, two chamber, high rep rate gas discharge laser system
CYMER INC236 citations98
US6018537AJan 25, 2000
Reliable, modular, production quality narrow-band high rep rate F2 laser
CYMER INC280 citations98
US5991324ANov 23, 1999
Reliable. modular, production quality narrow-band KRF excimer laser
CYMER INC196 citations98
US5936988AAug 10, 1999
High pulse rate pulse power system
CYMER INC154 citations98
US6972421B2Dec 6, 2005
Extreme ultraviolet light source
CYMER INC141 citations97
US6815700B2Nov 9, 2004
Plasma focus light source with improved pulse power system
CYMER INC113 citations97
US6757316B2Jun 29, 2004
Four KHz gas discharge laser
CYMER INC97 citations97
US6566668B2May 20, 2003
Plasma focus light source with tandem ellipsoidal mirror units
CYMER INC131 citations97
US6330261B1Dec 11, 2001
Reliable, modular, production quality narrow-band high rep rate ArF excimer laser
CYMER INC105 citations97
US6151346ANov 21, 2000
High pulse rate pulse power system with fast rise time and low current
CYMER INC89 citations97
US7368741B2May 6, 2008
Extreme ultraviolet light source
CYMER INC65 citations96
US6865210B2Mar 8, 2005
Timing control for two-chamber gas discharge laser system
CYMER INC43 citations96
US6586757B2Jul 1, 2003
Plasma focus light source with active and buffer gas control
CYMER INC139 citations96
US5949806ASep 7, 1999
High voltage cable interlock circuit
CYMER INC54 citations96
US5940421AAug 17, 1999
Current reversal prevention circuit for a pulsed gas discharge laser
CYMER INC77 citations96
US6590922B2Jul 8, 2003
Injection seeded F2 laser with line selection and discrimination
CYMER INC63 citations95
US6442181B1Aug 27, 2002
Extreme repetition rate gas discharge laser
CYMER INC56 citations95
US7203216B2Apr 10, 2007
Timing control for two-chamber gas discharge laser system
CYMER INC18 citations93
US7567607B2Jul 28, 2009
Very narrow band, two chamber, high rep-rate gas discharge laser system
CYMER INC14 citations92
US7079564B2Jul 18, 2006
Control system for a two chamber gas discharge laser
CYMER INC26 citations92
US7039086B2May 2, 2006
Control system for a two chamber gas discharge laser
CYMER INC32 citations92
US6985508B2Jan 10, 2006
Very narrow band, two chamber, high reprate gas discharge laser system
CYMER INC29 citations92
US6914919B2Jul 5, 2005
Six to ten KHz, or greater gas discharge laser system
CYMER INC34 citations92
US6801560B2Oct 5, 2004
Line selected F2 two chamber laser system
CYMER INC18 citations92
US6556600B2Apr 29, 2003
Injection seeded F2 laser with centerline wavelength control
CYMER INC27 citations92
USRE38054EApr 1, 2003
Reliable, modular, production quality narrow-band high rep rate F2 laser
CYMER INC42 citations92
US6240112B1May 29, 2001
High pulse rate pulse power system with liquid cooling
CYMER INC32 citations92
US6028872AFeb 22, 2000
High pulse rate pulse power system with resonant power supply
CYMER INC53 citations92
US7002443B2Feb 21, 2006
Method and apparatus for cooling magnetic circuit elements
CYMER INC35 citations90
US6882674B2Apr 19, 2005
Four KHz gas discharge laser system
CYMER INC31 citations90
US7058107B2Jun 6, 2006
Line selected F2 two chamber laser system
CYMER INC5 citations74
US7061961B2Jun 13, 2006
Very narrow band, two chamber, high rep-rate gas discharge laser system
CYMER INC5 citations73
US6327286B1Dec 4, 2001
High speed magnetic modulator voltage and temperature timing compensation circuit
CYMER INC11 citations73
USRE42588EAug 2, 2011
Control system for a two chamber gas discharge laser system
CYMER INC5 citations62
US7706424B2Apr 27, 2010
Gas discharge laser system electrodes and power supply for delivering electrical energy to same
CYMER INC6 citations62
US7596164B2Sep 29, 2009
Control system for a two chamber gas discharge laser
CYMER INC5 citations62
US7218661B2May 15, 2007
Line selected F2 two chamber laser system
CYMER INC4 citations62
US7852899B2Dec 14, 2010
Timing control for two-chamber gas discharge laser system
CYMER INC0 citations52