Inventor
KODAMA KUNIHIKO
JP135 patents
⚠️ This page may combine multiple inventors who share the name “KODAMA KUNIHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJI PHOTO FILM CO LTD
28 patentsUS6479211B1Nov 12, 2002
Positive photoresist composition for far ultraviolet exposure
FUJI PHOTO FILM CO LTD149 citations99
US6492091B2Dec 10, 2002
Positive photosensitive composition
FUJI PHOTO FILM CO LTD112 citations98
US5945250AAug 31, 1999
Positive photosensitive composition
FUJI PHOTO FILM CO LTD127 citations98
US6749987B2Jun 15, 2004
Positive photosensitive composition
FUJI PHOTO FILM CO LTD43 citations96
US6485883B2Nov 26, 2002
Positive photoresist composition
FUJI PHOTO FILM CO LTD71 citations96
US6291130B1Sep 18, 2001
Positive photosensitive composition
FUJI PHOTO FILM CO LTD60 citations96
US5837420ANov 17, 1998
Positive working photosensitive composition
FUJI PHOTO FILM CO LTD69 citations96
US6927009B2Aug 9, 2005
Positive photosensitive composition
FUJI PHOTO FILM CO LTD36 citations93
US6858370B2Feb 22, 2005
Positive photosensitive composition
FUJI PHOTO FILM CO LTD29 citations93
US6808862B2Oct 26, 2004
Positive photosensitive composition
FUJI PHOTO FILM CO LTD25 citations93
US6787283B1Sep 7, 2004
Positive photoresist composition for far ultraviolet exposure
FUJI PHOTO FILM CO LTD30 citations93
US6692884B2Feb 17, 2004
Positive photoresist composition
FUJI PHOTO FILM CO LTD28 citations93
US6596458B1Jul 22, 2003
Positive-working photoresist composition
FUJI PHOTO FILM CO LTD58 citations93
US6517991B1Feb 11, 2003
Positive photosensitive composition
FUJI PHOTO FILM CO LTD36 citations93
US6506535B1Jan 14, 2003
Positive working photoresist composition
FUJI PHOTO FILM CO LTD33 citations93
US6265135B1Jul 24, 2001
Positive-working electron beam or X-ray resist composition
FUJI PHOTO FILM CO LTD39 citations93
US6060213AMay 9, 2000
Positive-working photosensitive composition
FUJI PHOTO FILM CO LTD29 citations93
US5981140ANov 9, 1999
Positive photosensitive composition
FUJI PHOTO FILM CO LTD31 citations93
US5891603AApr 6, 1999
Positive working photosensitive composition
FUJI PHOTO FILM CO LTD27 citations93
US5629128AMay 13, 1997
Positive photoresist composition
FUJI PHOTO FILM CO LTD38 citations92
US6576392B1Jun 10, 2003
Positive photoresist composition
FUJI PHOTO FILM CO LTD47 citations91
US7189492B2Mar 13, 2007
Photosensitive composition and pattern forming method using the same
FUJI PHOTO FILM CO LTD26 citations90
US6830867B2Dec 14, 2004
Positive photosensitive composition
FUJI PHOTO FILM CO LTD19 citations84
US6777160B2Aug 17, 2004
Positive-working resist composition
FUJI PHOTO FILM CO LTD15 citations84
US6756179B2Jun 29, 2004
Positive resist composition
FUJI PHOTO FILM CO LTD17 citations84
US6733951B2May 11, 2004
Positive radiation-sensitive composition
FUJI PHOTO FILM CO LTD15 citations84
US6605409B2Aug 12, 2003
Positive resist composition
FUJI PHOTO FILM CO LTD18 citations84
US6544715B2Apr 8, 2003
Positive photoresist composition for far ultraviolet ray exposure
FUJI PHOTO FILM CO LTD19 citations84
FUJIFILM CORP
13 patentsUS8933144B2Jan 13, 2015
Curable composition for imprint, pattern-forming method and pattern
FUJIFILM CORP50 citations94
US8039200B2Oct 18, 2011
Photosensitive composition and pattern-forming method using the photosensitive composition
FUJIFILM CORP21 citations93
US7449573B2Nov 11, 2008
Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition
FUJIFILM CORP18 citations93
US7435526B2Oct 14, 2008
Positive photosensitive composition
FUJIFILM CORP14 citations93
US8025833B2Sep 27, 2011
Curable composition for nanoimprint, and patterning method
FUJIFILM CORP21 citations92
US7625690B2Dec 1, 2009
Positive resist composition and pattern forming method using the same
FUJIFILM CORP24 citations92
US8012665B2Sep 6, 2011
Positive photosensitive composition and pattern forming method using the same
FUJIFILM CORP7 citations84
US7960087B2Jun 14, 2011
Positive photosensitive composition and pattern-forming method using the same
FUJIFILM CORP9 citations84
US7867697B2Jan 11, 2011
Positive photosensitive composition and method of forming resist pattern
FUJIFILM CORP8 citations84
US7799505B2Sep 21, 2010
Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
FUJIFILM CORP16 citations84
US7749679B2Jul 6, 2010
Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition
FUJIFILM CORP10 citations84
US7341817B2Mar 11, 2008
Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition
FUJIFILM CORP13 citations84
US7273690B2Sep 25, 2007
Positive resist composition for immersion exposure and method of pattern formation with the same
FUJIFILM CORP17 citations84
CIBA SC HOLDING AG
3 patentsUS6274065B1Aug 14, 2001
Process for the preparation of fluorescent compositions, fluorescent compositions and their use
CIBA SC HOLDING AG26 citations95
US6413655B2Jul 2, 2002
Fluorescent materials and their use
CIBA SC HOLDING AG15 citations92
US6258954B1Jul 10, 2001
Fluorescent maleimides and uses thereof
CIBA SC HOLDING AG30 citations92
TOSHIBA KK
3 patentsUS5553041ASep 3, 1996
Disc data reproducing apparatus and signal processing unit for preventing underflow and overflow
TOSHIBA KK23 citations92
US6430723B2Aug 6, 2002
Error correcting device and data reproducing apparatus provided therewith
TOSHIBA KK40 citations90
US6505319B1Jan 7, 2003
Signal processing circuit and information recording apparatus
TOSHIBA KK14 citations84
KODAMA KUNIHIKO
2 patentsFUJITSU LTD
1 patentShowing the top 50 of 135 patents by PatentIndex Score.