Inventor
KIM SARAH E
US44 patents
⚠️ This page may combine multiple inventors who share the name “KIM SARAH E”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INTEL CORP
42 patentsUS7157787B2Jan 2, 2007
Process of vertically stacking multiple wafers supporting different active integrated circuit (IC) devices
INTEL CORP867 citations99
US7056807B2Jun 6, 2006
Barrier structure against corrosion and contamination in three-dimensional (3-D) wafer-to-wafer vertical stack
INTEL CORP245 citations99
US7037804B2May 2, 2006
Wafer bonding using a flexible bladder press for three dimensional (3D) vertical stack integration
INTEL CORP258 citations99
US6975016B2Dec 13, 2005
Wafer bonding using a flexible bladder press and thinned wafers for three-dimensional (3D) wafer-to-wafer vertical stack integration, and application thereof
INTEL CORP252 citations99
US6908565B2Jun 21, 2005
Etch thinning techniques for wafer-to-wafer vertical stacks
INTEL CORP251 citations99
US6887769B2May 3, 2005
Dielectric recess for wafer-to-wafer and die-to-die metal bonding and method of fabricating the same
INTEL CORP516 citations99
US6790748B2Sep 14, 2004
Thinning techniques for wafer-to-wafer vertical stacks
INTEL CORP242 citations99
US6762076B2Jul 13, 2004
Process of vertically stacking multiple wafers supporting different active integrated circuit (IC) devices
INTEL CORP579 citations99
US6661085B2Dec 9, 2003
Barrier structure against corrosion and contamination in three-dimensional (3-D) wafer-to-wafer vertical stack
INTEL CORP536 citations99
US7615462B2Nov 10, 2009
Etch stop layer for silicon (Si) via etch in three-dimensional (3-D) wafer-to-wafer vertical stack
INTEL CORP154 citations98
US7410884B2Aug 12, 2008
3D integrated circuits using thick metal for backside connections and offset bumps
INTEL CORP278 citations98
US7056813B2Jun 6, 2006
Methods of forming backside connections on a wafer stack
INTEL CORP77 citations98
US6943440B2Sep 13, 2005
Methods of processing thick ILD layers using spray coating or lamination for C4 wafer level thick metal integrated flow
INTEL CORP151 citations98
US6897125B2May 24, 2005
Methods of forming backside connections on a wafer stack
INTEL CORP95 citations98
US6911373B2Jun 28, 2005
Ultra-high capacitance device based on nanostructures
INTEL CORP32 citations96
US7148565B2Dec 12, 2006
Etch stop layer for silicon (Si) via etch in three-dimensional (3-D) wafer-to-wafer vertical stack
INTEL CORP61 citations95
US6645832B2Nov 11, 2003
Etch stop layer for silicon (Si) via etch in three-dimensional (3-D) wafer-to-wafer vertical stack
INTEL CORP67 citations95
US6977435B2Dec 20, 2005
Thick metal layer integrated process flow to improve power delivery and mechanical buffering
INTEL CORP82 citations94
US7696015B2Apr 13, 2010
Method of forming a stack of heat generating integrated circuit chips with intervening cooling integrated circuit chips
INTEL CORP15 citations93
US7183648B2Feb 27, 2007
Method and apparatus for low temperature copper to copper bonding
INTEL CORP43 citations93
US7105382B2Sep 12, 2006
Self-aligned electrodes contained within the trenches of an electroosmotic pump
INTEL CORP20 citations93
US7265406B2Sep 4, 2007
Capacitor with conducting nanostructure
INTEL CORP12 citations92
US7227257B2Jun 5, 2007
Cooling micro-channels
INTEL CORP17 citations92
US6992381B2Jan 31, 2006
Using external radiators with electroosmotic pumps for cooling integrated circuits
INTEL CORP16 citations92
US6870270B2Mar 22, 2005
Method and structure for interfacing electronic devices
INTEL CORP25 citations92
US6599808B2Jul 29, 2003
Method and device for on-chip decoupling capacitor using nanostructures as bottom electrode
INTEL CORP24 citations92
US6981849B2Jan 3, 2006
Electro-osmotic pumps and micro-channels
INTEL CORP20 citations91
US7091084B2Aug 15, 2006
Ultra-high capacitance device based on nanostructures
INTEL CORP11 citations84
US7034394B2Apr 25, 2006
Microelectronic assembly having thermoelectric elements to cool a die and a method of making the same
INTEL CORP12 citations84
US7973407B2Jul 5, 2011
Three-dimensional stacked substrate arrangements
INTEL CORP12 citations83
US7842553B2Nov 30, 2010
Cooling micro-channels
INTEL CORP6 citations74
US7271434B2Sep 18, 2007
Capacitor with insulating nanostructure
INTEL CORP7 citations74
US7244983B2Jul 17, 2007
Method and device for on-chip decoupling capacitor using nanostructures as bottom electrode
INTEL CORP9 citations74
US7084495B2Aug 1, 2006
Electroosmotic pumps using porous frits for cooling integrated circuit stacks
INTEL CORP7 citations74
US7105925B2Sep 12, 2006
Differential planarization
INTEL CORP6 citations72
US7537954B2May 26, 2009
Microelectronic assembly having thermoelectric elements to cool a die and a method of making the same
INTEL CORP4 citations63
US7274106B2Sep 25, 2007
Packaged electroosmotic pumps using porous frits for cooling integrated circuits
INTEL CORP2 citations63
US6790780B2Sep 14, 2004
Fabrication of 3-D capacitor with dual damascene process
INTEL CORP4 citations63
US7348217B2Mar 25, 2008
Method and structure for interfacing electronic devices
INTEL CORP2 citations62
US7723208B2May 25, 2010
Integrated re-combiner for electroosmotic pumps using porous frits
INTEL CORP0 citations52
US7576432B2Aug 18, 2009
Using external radiators with electroosmotic pumps for cooling integrated circuits
INTEL CORP1 citations52
US6914002B2Jul 5, 2005
Differential planarization
INTEL CORP0 citations51