Inventor
FISHBURN FRED
US35 patents
⚠️ This page may combine multiple inventors who share the name “FISHBURN FRED”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
28 patentsUS6787833B1Sep 7, 2004
Integrated circuit having a barrier structure
MICRON TECHNOLOGY INC40 citations96
US6707088B2Mar 16, 2004
Method of forming integrated circuitry, method of forming a capacitor, method of forming DRAM integrated circuitry and DRAM integrated category
MICRON TECHNOLOGY INC49 citations96
US6372574B1Apr 16, 2002
Method of forming a capacitor container electrode and method of patterning a metal layer by selectively silicizing the electrode or metal layer and removing the silicized portion
MICRON TECHNOLOGY INC65 citations96
US7321150B2Jan 22, 2008
Semiconductor device precursor structures to a double-sided capacitor or a contact
MICRON TECHNOLOGY INC39 citations95
US7268039B2Sep 11, 2007
Method of forming a contact using a sacrificial structure
MICRON TECHNOLOGY INC40 citations95
US6613671B1Sep 2, 2003
Conductive connection forming methods, oxidation reducing methods, and integrated circuits formed thereby
MICRON TECHNOLOGY INC19 citations93
US7759193B2Jul 20, 2010
Methods of forming a plurality of capacitors
MICRON TECHNOLOGY INC25 citations92
US7273779B2Sep 25, 2007
Method of forming a double-sided capacitor
MICRON TECHNOLOGY INC31 citations92
US7084004B2Aug 1, 2006
MEMS heat pumps for integrated circuit heat dissipation
MICRON TECHNOLOGY INC23 citations92
US7071055B2Jul 4, 2006
Method of forming a contact structure including a vertical barrier structure and two barrier layers
MICRON TECHNOLOGY INC32 citations92
US6962846B2Nov 8, 2005
Methods of forming a double-sided capacitor or a contact using a sacrificial structure
MICRON TECHNOLOGY INC34 citations92
US6629425B2Oct 7, 2003
MEMS heat pumps for integrated circuit heat dissipation
MICRON TECHNOLOGY INC32 citations92
US6492267B1Dec 10, 2002
Low temperature nitride used as Cu barrier layer
MICRON TECHNOLOGY INC19 citations92
US6475855B1Nov 5, 2002
Method of forming integrated circuitry, method of forming a capacitor and method of forming DRAM integrated circuitry
MICRON TECHNOLOGY INC39 citations92
US7473644B2Jan 6, 2009
Method for forming controlled geometry hardmasks including subresolution elements
MICRON TECHNOLOGY INC15 citations84
US7329607B2Feb 12, 2008
Conductive connection forming methods, oxidation reducing methods, and integrated circuits formed thereby
MICRON TECHNOLOGY INC10 citations84
US7271086B2Sep 18, 2007
Microfeature workpieces and methods of forming a redistribution layer on microfeature workpieces
MICRON TECHNOLOGY INC18 citations82
US7569453B2Aug 4, 2009
Contact structure
MICRON TECHNOLOGY INC5 citations74
US7220663B2May 22, 2007
Conductive connection forming methods, oxidation reducing methods, and integrated circuits formed thereby
MICRON TECHNOLOGY INC4 citations74
US7157324B2Jan 2, 2007
Transistor structure having reduced transistor leakage attributes
MICRON TECHNOLOGY INC6 citations74
US6756678B2Jun 29, 2004
Conductive connection forming methods, oxidation reducing methods, and integrated circuits formed thereby
MICRON TECHNOLOGY INC7 citations74
US7186642B2Mar 6, 2007
Low temperature nitride used as Cu barrier layer
MICRON TECHNOLOGY INC5 citations73
US8687426B2Apr 1, 2014
Multi-semiconductor material vertical memory strings, strings of memory cells having individually biasable channel regions, memory arrays incorporating such strings, and methods of accesssing and forming the same
MICRON TECHNOLOGY INC3 citations63
US7176576B2Feb 13, 2007
Conductive connection forming methods, oxidation reducing methods, and integrated circuits formed thereby
MICRON TECHNOLOGY INC3 citations63
US7105899B2Sep 12, 2006
Transistor structure having reduced transistor leakage attributes
MICRON TECHNOLOGY INC2 citations63
US6984893B2Jan 10, 2006
Low temperature nitride used as Cu barrier layer
MICRON TECHNOLOGY INC2 citations62
US8026542B2Sep 27, 2011
Low resistance peripheral local interconnect contacts with selective wet strip of titanium
MICRON TECHNOLOGY INC1 citations61
US7605033B2Oct 20, 2009
Low resistance peripheral local interconnect contacts with selective wet strip of titanium
MICRON TECHNOLOGY INC4 citations61
APPLIED MATERIALS INC
4 patentsUS11380691B1Jul 5, 2022
CMOS over array of 3-D DRAM device
APPLIED MATERIALS INC3 citations73
US12482749B2Nov 25, 2025
L-type wordline connection structure for three-dimensional memory
APPLIED MATERIALS INC0 citations62
US11980021B2May 7, 2024
CMOS over array of 3-D DRAM device
APPLIED MATERIALS INC0 citations62
US12477723B2Nov 18, 2025
Three dimensional memory device and method of fabrication
APPLIED MATERIALS INC0 citations52