Inventor
XU ZHENG
US277 patents
⚠️ This page may combine multiple inventors who share the name “XU ZHENG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
43 patentsUS6919275B2Jul 19, 2005
Method of preventing diffusion of copper through a tantalum-comprising barrier layer
APPLIED MATERIALS INC87 citations99
US6451177B1Sep 17, 2002
Vault shaped target and magnetron operable in two sputtering modes
APPLIED MATERIALS INC103 citations99
US6413382B1Jul 2, 2002
Pulsed sputtering with a small rotating magnetron
APPLIED MATERIALS INC171 citations99
US6217721B1Apr 17, 2001
Filling narrow apertures and forming interconnects with a metal utilizing a crystallographically oriented liner layer
APPLIED MATERIALS INC206 citations99
US5962923AOct 5, 1999
Semiconductor device having a low thermal budget metal filling and planarization of contacts, vias and trenches
APPLIED MATERIALS INC142 citations99
US6692617B1Feb 17, 2004
Sustained self-sputtering reactor having an increased density plasma
APPLIED MATERIALS INC79 citations98
US6277249B1Aug 21, 2001
Integrated process for copper via filling using a magnetron and target producing highly energetic ions
APPLIED MATERIALS INC273 citations98
US6274008B1Aug 14, 2001
Integrated process for copper via filling
APPLIED MATERIALS INC231 citations98
US6190513B1Feb 20, 2001
Darkspace shield for improved RF transmission in inductively coupled plasma sources for sputter deposition
APPLIED MATERIALS INC90 citations98
US7048837B2May 23, 2006
End point detection for sputtering and resputtering
APPLIED MATERIALS INC68 citations97
US6051114AApr 18, 2000
Use of pulsed-DC wafer bias for filling vias/trenches with metal in HDP physical vapor deposition
APPLIED MATERIALS INC304 citations97
US7253109B2Aug 7, 2007
Method of depositing a tantalum nitride/tantalum diffusion barrier layer system
APPLIED MATERIALS INC44 citations96
US7074714B2Jul 11, 2006
Method of depositing a metal seed layer on semiconductor substrates
APPLIED MATERIALS INC26 citations96
US6991709B2Jan 31, 2006
Multi-step magnetron sputtering process
APPLIED MATERIALS INC46 citations96
US6787006B2Sep 7, 2004
Operating a magnetron sputter reactor in two modes
APPLIED MATERIALS INC53 citations96
US6758947B2Jul 6, 2004
Damage-free sculptured coating deposition
APPLIED MATERIALS INC47 citations96
US6610184B2Aug 26, 2003
Magnet array in conjunction with rotating magnetron for plasma sputtering
APPLIED MATERIALS INC44 citations96
US6485618B2Nov 26, 2002
Integrated copper fill process
APPLIED MATERIALS INC47 citations96
US6399479B1Jun 4, 2002
Processes to improve electroplating fill
APPLIED MATERIALS INC74 citations96
US6368469B1Apr 9, 2002
Coils for generating a plasma and for sputtering
APPLIED MATERIALS INC48 citations96
US6238528B1May 29, 2001
Plasma density modulator for improved plasma density uniformity and thickness uniformity in an ionized metal plasma source
APPLIED MATERIALS INC55 citations96
US6136095AOct 24, 2000
Apparatus for filling apertures in a film layer on a semiconductor substrate
APPLIED MATERIALS INC52 citations96
US6045666AApr 4, 2000
Aluminum hole filling method using ionized metal adhesion layer
APPLIED MATERIALS INC61 citations96
US5911113AJun 8, 1999
Silicon-doped titanium wetting layer for aluminum plug
APPLIED MATERIALS INC65 citations96
US5902461AMay 11, 1999
Apparatus and method for enhancing uniformity of a metal film formed on a substrate with the aid of an inductively coupled plasma
APPLIED MATERIALS INC88 citations96
US5841624ANov 24, 1998
Cover layer for a substrate support chuck and method of fabricating same
APPLIED MATERIALS INC60 citations96
US5763851AJun 9, 1998
Slotted RF coil shield for plasma deposition system
APPLIED MATERIALS INC93 citations96
US5736021AApr 7, 1998
Electrically floating shield in a plasma reactor
APPLIED MATERIALS INC91 citations96
US5639357AJun 17, 1997
Synchronous modulation bias sputter method and apparatus for complete planarization of metal films
APPLIED MATERIALS INC71 citations96
US5467220ANov 14, 1995
Method and apparatus for improving semiconductor wafer surface temperature uniformity
APPLIED MATERIALS INC72 citations96
US6372633B1Apr 16, 2002
Method and apparatus for forming metal interconnects
APPLIED MATERIALS INC58 citations95
US6080285AJun 27, 2000
Multiple step ionized metal plasma deposition process for conformal step coverage
APPLIED MATERIALS INC124 citations95
US5780357AJul 14, 1998
Deposition process for coating or filling re-entry shaped contact holes
APPLIED MATERIALS INC65 citations95
US7381639B2Jun 3, 2008
Method of depositing a metal seed layer on semiconductor substrates
APPLIED MATERIALS INC10 citations93
US6660134B1Dec 9, 2003
Feedthrough overlap coil
APPLIED MATERIALS INC29 citations93
US6599399B2Jul 29, 2003
Sputtering method to generate ionized metal plasma using electron beams and magnetic field
APPLIED MATERIALS INC29 citations93
US6514390B1Feb 4, 2003
Method to eliminate coil sputtering in an ICP source
APPLIED MATERIALS INC42 citations93
US6238803B1May 29, 2001
Titanium nitride barrier layers
APPLIED MATERIALS INC20 citations93
US6231725B1May 15, 2001
Apparatus for sputtering material onto a workpiece with the aid of a plasma
APPLIED MATERIALS INC41 citations93
US5976334ANov 2, 1999
Reliable sustained self-sputtering
APPLIED MATERIALS INC42 citations93
US5895266AApr 20, 1999
Titanium nitride barrier layers
APPLIED MATERIALS INC23 citations93
US5876574AMar 2, 1999
Magnet design for a sputtering chamber
APPLIED MATERIALS INC31 citations93
US5851364ADec 22, 1998
Method for forming aluminum contacts
APPLIED MATERIALS INC19 citations93
SIGA PHARMACEUTICALS INC
2 patentsFINKELSTEIN YURI
1 patentUNIV WASHINGTON
1 patent(unassigned)
1 patentSOLARCITY CORP
1 patentSILEVO INC
1 patentShowing the top 50 of 277 patents by PatentIndex Score.