P

Inventor

XU ZHENG

US277 patents
⚠️ This page may combine multiple inventors who share the name “XU ZHENG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

43 patents
US6919275B2Jul 19, 2005

Method of preventing diffusion of copper through a tantalum-comprising barrier layer

APPLIED MATERIALS INC87 citations99
US6451177B1Sep 17, 2002

Vault shaped target and magnetron operable in two sputtering modes

APPLIED MATERIALS INC103 citations99
US6413382B1Jul 2, 2002

Pulsed sputtering with a small rotating magnetron

APPLIED MATERIALS INC171 citations99
US6217721B1Apr 17, 2001

Filling narrow apertures and forming interconnects with a metal utilizing a crystallographically oriented liner layer

APPLIED MATERIALS INC206 citations99
US5962923AOct 5, 1999

Semiconductor device having a low thermal budget metal filling and planarization of contacts, vias and trenches

APPLIED MATERIALS INC142 citations99
US6692617B1Feb 17, 2004

Sustained self-sputtering reactor having an increased density plasma

APPLIED MATERIALS INC79 citations98
US6277249B1Aug 21, 2001

Integrated process for copper via filling using a magnetron and target producing highly energetic ions

APPLIED MATERIALS INC273 citations98
US6274008B1Aug 14, 2001

Integrated process for copper via filling

APPLIED MATERIALS INC231 citations98
US6190513B1Feb 20, 2001

Darkspace shield for improved RF transmission in inductively coupled plasma sources for sputter deposition

APPLIED MATERIALS INC90 citations98
US7048837B2May 23, 2006

End point detection for sputtering and resputtering

APPLIED MATERIALS INC68 citations97
US6051114AApr 18, 2000

Use of pulsed-DC wafer bias for filling vias/trenches with metal in HDP physical vapor deposition

APPLIED MATERIALS INC304 citations97
US7253109B2Aug 7, 2007

Method of depositing a tantalum nitride/tantalum diffusion barrier layer system

APPLIED MATERIALS INC44 citations96
US7074714B2Jul 11, 2006

Method of depositing a metal seed layer on semiconductor substrates

APPLIED MATERIALS INC26 citations96
US6991709B2Jan 31, 2006

Multi-step magnetron sputtering process

APPLIED MATERIALS INC46 citations96
US6787006B2Sep 7, 2004

Operating a magnetron sputter reactor in two modes

APPLIED MATERIALS INC53 citations96
US6758947B2Jul 6, 2004

Damage-free sculptured coating deposition

APPLIED MATERIALS INC47 citations96
US6610184B2Aug 26, 2003

Magnet array in conjunction with rotating magnetron for plasma sputtering

APPLIED MATERIALS INC44 citations96
US6485618B2Nov 26, 2002

Integrated copper fill process

APPLIED MATERIALS INC47 citations96
US6399479B1Jun 4, 2002

Processes to improve electroplating fill

APPLIED MATERIALS INC74 citations96
US6368469B1Apr 9, 2002

Coils for generating a plasma and for sputtering

APPLIED MATERIALS INC48 citations96
US6238528B1May 29, 2001

Plasma density modulator for improved plasma density uniformity and thickness uniformity in an ionized metal plasma source

APPLIED MATERIALS INC55 citations96
US6136095AOct 24, 2000

Apparatus for filling apertures in a film layer on a semiconductor substrate

APPLIED MATERIALS INC52 citations96
US6045666AApr 4, 2000

Aluminum hole filling method using ionized metal adhesion layer

APPLIED MATERIALS INC61 citations96
US5911113AJun 8, 1999

Silicon-doped titanium wetting layer for aluminum plug

APPLIED MATERIALS INC65 citations96
US5902461AMay 11, 1999

Apparatus and method for enhancing uniformity of a metal film formed on a substrate with the aid of an inductively coupled plasma

APPLIED MATERIALS INC88 citations96
US5841624ANov 24, 1998

Cover layer for a substrate support chuck and method of fabricating same

APPLIED MATERIALS INC60 citations96
US5763851AJun 9, 1998

Slotted RF coil shield for plasma deposition system

APPLIED MATERIALS INC93 citations96
US5736021AApr 7, 1998

Electrically floating shield in a plasma reactor

APPLIED MATERIALS INC91 citations96
US5639357AJun 17, 1997

Synchronous modulation bias sputter method and apparatus for complete planarization of metal films

APPLIED MATERIALS INC71 citations96
US5467220ANov 14, 1995

Method and apparatus for improving semiconductor wafer surface temperature uniformity

APPLIED MATERIALS INC72 citations96
US6372633B1Apr 16, 2002

Method and apparatus for forming metal interconnects

APPLIED MATERIALS INC58 citations95
US6080285AJun 27, 2000

Multiple step ionized metal plasma deposition process for conformal step coverage

APPLIED MATERIALS INC124 citations95
US5780357AJul 14, 1998

Deposition process for coating or filling re-entry shaped contact holes

APPLIED MATERIALS INC65 citations95
US7381639B2Jun 3, 2008

Method of depositing a metal seed layer on semiconductor substrates

APPLIED MATERIALS INC10 citations93
US6660134B1Dec 9, 2003

Feedthrough overlap coil

APPLIED MATERIALS INC29 citations93
US6599399B2Jul 29, 2003

Sputtering method to generate ionized metal plasma using electron beams and magnetic field

APPLIED MATERIALS INC29 citations93
US6514390B1Feb 4, 2003

Method to eliminate coil sputtering in an ICP source

APPLIED MATERIALS INC42 citations93
US6238803B1May 29, 2001

Titanium nitride barrier layers

APPLIED MATERIALS INC20 citations93
US6231725B1May 15, 2001

Apparatus for sputtering material onto a workpiece with the aid of a plasma

APPLIED MATERIALS INC41 citations93
US5976334ANov 2, 1999

Reliable sustained self-sputtering

APPLIED MATERIALS INC42 citations93
US5895266AApr 20, 1999

Titanium nitride barrier layers

APPLIED MATERIALS INC23 citations93
US5876574AMar 2, 1999

Magnet design for a sputtering chamber

APPLIED MATERIALS INC31 citations93
US5851364ADec 22, 1998

Method for forming aluminum contacts

APPLIED MATERIALS INC19 citations93

SIGA PHARMACEUTICALS INC

2 patents

FINKELSTEIN YURI

1 patent

UNIV WASHINGTON

1 patent

(unassigned)

1 patent

SOLARCITY CORP

1 patent

SILEVO INC

1 patent

Showing the top 50 of 277 patents by PatentIndex Score.