Inventor
NUMATA REMI
JP3 patents
Patents
3 patentsUS5501936AMar 26, 1996
Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound
TOKYO OHKA KOGYO CO LTD15 citations72
US5478692ADec 26, 1995
Positive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenone
TOKYO OHKA KOGYO CO LTD13 citations72
US5434031AJul 18, 1995
Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive
TOKYO OHKA KOGYO CO LTD16 citations72