Inventor

TOKUTAKE NOBUO

JP15 patents

⚠️ This page may combine multiple inventors who share the name “TOKUTAKE NOBUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO OHKA KOGYO CO LTD

12 patents

US5601961AFeb 11, 1997

High-sensitivity positive-working photoresist composition

TOKYO OHKA KOGYO CO LTD24 citations92

US4882260ANov 21, 1989

Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye

TOKYO OHKA KOGYO CO LTD19 citations81

US5498514AMar 12, 1996

Lithographic double-coated patterning plate with undercoat levelling layer

TOKYO OHKA KOGYO CO LTD13 citations74

US4985333AJan 15, 1991

Positive-working photosensitive composition with three difference 1,2-naphthoquinone diazide sulfonic acid esters to include the ester of curcumin

TOKYO OHKA KOGYO CO LTD8 citations74

US5384228AJan 24, 1995

Alkali-developable positive-working photosensitive resin composition

TOKYO OHKA KOGYO CO LTD8 citations73

US5576138ANov 19, 1996

Positive-working naphtho quinone diazide sulfonic acid ester photoresist composition containing select combination of additives

TOKYO OHKA KOGYO CO LTD13 citations72

US5501936AMar 26, 1996

Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound

TOKYO OHKA KOGYO CO LTD15 citations72

US5478692ADec 26, 1995

Positive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenone

TOKYO OHKA KOGYO CO LTD13 citations72

US5434031AJul 18, 1995

Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive

TOKYO OHKA KOGYO CO LTD16 citations72

US5332647AJul 26, 1994

Positive-working quinone diazide composition containing N,N',N"-substituted isocyanurate compound and associated article

TOKYO OHKA KOGYO CO LTD9 citations72

US5599653AFeb 4, 1997

Pattern forming method with selective silylation utilizing lithographic double-coated patterning plate with undercoat levelling layer

TOKYO OHKA KOGYO CO LTD5 citations63

US5401605AMar 28, 1995

Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound

TOKYO OHKA KOGYO CO LTD5 citations62

CANON KK

3 patents

US6132817AOct 17, 2000

Method of manufacturing photoelectric transducer with improved ultrasonic and purification steps

CANON KK22 citations92

US7935397B2May 3, 2011

Ink jet recording medium and ink jet recording method

CANON KK7 citations82

US7425457B2Sep 16, 2008

Method and apparatus for irradiating simulated solar radiation

CANON KK5 citations62