Inventor
YAMAZAWA YOHEI
JP72 patents
⚠️ This page may combine multiple inventors who share the name “YAMAZAWA YOHEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
32 patentsUS9941097B2Apr 10, 2018
Plasma processing apparatus
TOKYO ELECTRON LTD110 citations99
US7951262B2May 31, 2011
Plasma processing apparatus and method
TOKYO ELECTRON LTD486 citations99
US7415940B2Aug 26, 2008
Plasma processor
TOKYO ELECTRON LTD75 citations98
US7988816B2Aug 2, 2011
Plasma processing apparatus and method
TOKYO ELECTRON LTD63 citations97
US7740737B2Jun 22, 2010
Plasma processing apparatus and method
TOKYO ELECTRON LTD25 citations92
US7582182B2Sep 1, 2009
Method and apparatus for measuring electron density of plasma and plasma processing apparatus
TOKYO ELECTRON LTD14 citations92
US7339656B2Mar 4, 2008
Method and apparatus for measuring electron density of plasma and plasma processing apparatus
TOKYO ELECTRON LTD20 citations92
US9997332B2Jun 12, 2018
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD11 citations84
US9953811B2Apr 24, 2018
Plasma processing method
TOKYO ELECTRON LTD16 citations84
US9490105B2Nov 8, 2016
Plasma processing apparatus and method
TOKYO ELECTRON LTD6 citations84
US7712436B2May 11, 2010
Plasma processing apparatus with filter circuit
TOKYO ELECTRON LTD15 citations84
US7432467B2Oct 7, 2008
Plasma processing apparatus
TOKYO ELECTRON LTD11 citations84
US7527016B2May 5, 2009
Plasma processing apparatus
TOKYO ELECTRON LTD16 citations82
US6448094B2Sep 10, 2002
Method of detecting etching depth
TOKYO ELECTRON LTD15 citations81
US11600474B2Mar 7, 2023
RF voltage and current (V-I) sensors and measurement methods
TOKYO ELECTRON LTD6 citations74
US7611603B2Nov 3, 2009
Plasma processing apparatus having impedance varying electrodes
TOKYO ELECTRON LTD7 citations74
US7462293B2Dec 9, 2008
Method and apparatus for measuring electron density of plasma and plasma processing apparatus
TOKYO ELECTRON LTD4 citations74
US11990318B2May 21, 2024
Filter circuit
TOKYO ELECTRON LTD2 citations73
US11410832B2Aug 9, 2022
RF measurement system and method
TOKYO ELECTRON LTD2 citations73
US10854431B2Dec 1, 2020
Plasma processing apparatus and method
TOKYO ELECTRON LTD2 citations73
US10804076B2Oct 13, 2020
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD3 citations73
US10546727B2Jan 28, 2020
Plasma processing apparatus and method
TOKYO ELECTRON LTD2 citations73
US10381197B2Aug 13, 2019
Transformer, plasma processing apparatus, and plasma processing method
TOKYO ELECTRON LTD2 citations73
US10020167B2Jul 10, 2018
Plasma processing apparatus
TOKYO ELECTRON LTD3 citations73
US9583312B2Feb 28, 2017
Film formation device, substrate processing device, and film formation method
TOKYO ELECTRON LTD5 citations73
US9167680B2Oct 20, 2015
Plasma processing apparatus, plasma generating apparatus, antenna structure and plasma generating method
TOKYO ELECTRON LTD5 citations73
US11817296B2Nov 14, 2023
RF voltage and current (V-I) sensors and measurement methods
TOKYO ELECTRON LTD2 citations72
US12451327B2Oct 21, 2025
Apparatus for plasma processing
TOKYO ELECTRON LTD1 citations64
US12586762B2Mar 24, 2026
Filter circuit
TOKYO ELECTRON LTD0 citations63
US10679867B2Jun 9, 2020
Plasma processing apparatus
TOKYO ELECTRON LTD1 citations63
US9899191B2Feb 20, 2018
Plasma processing apparatus
TOKYO ELECTRON LTD1 citations63
US9502215B2Nov 22, 2016
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD2 citations63
YAMAZAWA YOHEI
14 patentsUS9313872B2Apr 12, 2016
Plasma processing apparatus and plasma processing method
YAMAZAWA YOHEI52 citations98
US8415885B2Apr 9, 2013
Plasma processing apparatus and plasma processing method
YAMAZAWA YOHEI25 citations93
US9627181B2Apr 18, 2017
Plasma processing apparatus
YAMAZAWA YOHEI17 citations84
US9293299B2Mar 22, 2016
Plasma processing apparatus
YAMAZAWA YOHEI16 citations84
US9275837B2Mar 1, 2016
Plasma processing apparatus
YAMAZAWA YOHEI7 citations84
US9253867B2Feb 2, 2016
Plasma processing apparatus and plasma processing method
YAMAZAWA YOHEI11 citations84
US9218943B2Dec 22, 2015
Plasma processing apparatus and plasma processing method
YAMAZAWA YOHEI8 citations84
US8741097B2Jun 3, 2014
Plasma processing apparatus and plasma processing method
YAMAZAWA YOHEI7 citations84
US8608903B2Dec 17, 2013
Plasma processing apparatus and plasma processing method
YAMAZAWA YOHEI9 citations84
US8398815B2Mar 19, 2013
Plasma processing apparatus
YAMAZAWA YOHEI12 citations84
US8261691B2Sep 11, 2012
Plasma processing apparatus
YAMAZAWA YOHEI7 citations84
US8251011B2Aug 28, 2012
Plasma processing apparatus
YAMAZAWA YOHEI13 citations82
US9119282B2Aug 25, 2015
Plasma processing apparatus and plasma processing method
YAMAZAWA YOHEI2 citations63
US8647442B2Feb 11, 2014
Cleaning substrate and cleaning method
YAMAZAWA YOHEI2 citations63
KOSHIISHI AKIRA
2 patentsKOSHIMIZU CHISHIO
2 patentsShowing the top 50 of 72 patents by PatentIndex Score.