Inventor

CHEN KUANG-JUNG

US70 patents

⚠️ This page may combine multiple inventors who share the name “CHEN KUANG-JUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHEN KUANG-JUNG

IBM

Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewith

Optimization of space width for hybrid photoresist

Energy sensitive electrically conductive admixtures

Approach to formulating irradiation sensitive positive resists

Blends of hydroxystyrene polymers for use in chemically amplified positive resist formulations

Photoresist compositions and method for multiple exposures with multiple layer resist systems

Photoresist compositions and method for multiple exposures with multiple layer resist systems

Low silicon-outgassing resist for bilayer lithography

Thiophene-containing photo acid generators for photolithography

Approach to formulating irradiation sensitive positive resists

Si-containing polymers for nano-pattern device fabrication

Developable bottom antireflective coating composition and pattern forming method using thereof

Hybrid photoresist composition and pattern forming method using thereof

Photoresist compositions and process for multiple exposures with multiple layer photoresist systems

Low activation energy positive resist

Positive resist containing naphthol functionality

Metallic mask patterning process for minimizing collateral etch of an underlayer

CHEN KUANG-JUNG

Method for removing threshold voltage adjusting layer with external acid diffusion process

Package of environmentally sensitive electronic device and fabricating method thereof

Touch-sensing display apparatus and fabricating method thereof

Multiple exposure photolithography methods and photoresist compositions

Developable bottom antireflective coating composition and pattern forming method using thereof

Encapsulation method of environmentally sensitive electronic element

Method of multiple patterning to form semiconductor devices

Touch-sensing display apparatus and fabricating method thereof

Developable bottom antireflective coating compositions for negative resists

Package of environmental sensitive element and encapsulation method of the same

Method for fabricating the flexible electronic device

Package of environmental sensitive electronic element

Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof

Photoresist compositions

Multiple exposure photolithography methods

Package of environmental sensitive element

IND TECH RES INST

Transparent display device with wall structure

Package of environmentally sensitive electronic device and fabricating method thereof

Environmental sensitive electronic device package

Environmental sensitive element package and encapsulation method thereof

Foldable package structure

Package of environmental sensitive element

Barrier functional film and manufacturing thereof, environmental sensitive electronic device, and display apparatus

Transparent display device, control method thereof and controller thereof

Light emitting device

Functional film

INFINEON TECHNOLOGIES AG

Method of reducing post-development defects in and around openings formed in photoresist by use of non-patterned exposure

Method of reducing post-development defects in and around openings formed in photoresist by use of multiple development/rinse cycles

SHIPLEY CO LLC

Photoresist comprising blends of photoacid generators

INTERNAT BUSINESS MACHINES MAC

Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups

JSR CORP

193nm resist with improved post-exposure properties

WINDELL CORP

Method for packaging organic electroluminescent device

ARNOLD JOHN C

Method of fabricating dual damascene structures using a multilevel multiple exposure patterning scheme