Inventor

HUANG WU-SONG

US94 patents

⚠️ This page may combine multiple inventors who share the name “HUANG WU-SONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HUANG WU-SONG

IBM

Antireflective SiO-containing compositions for hardmask layer

Antireflective silicon-containing compositions as hardmask layer

Antireflective silicon-containing compositions as hardmask layer

Mask-making using resist having SIO bond-containing polymer

Electrically conductive polymeric

Hybrid resist based on photo acid/photo base blending

E-beam application to mask making using new improved KRS resist system

E-beam application to mask making using new improved KRS resist system

Fabrication of printed circuit boards using conducting polymer

Solder/polymer composite paste and method

High contrast photoresists comprising acid sensitive crosslinked polymeric resins

Acid scavengers for use in chemically amplified photoresists

Molecular photoresists containing nonpolymeric silsesquioxanes

Low-activation energy silicon-containing resist system

Optimization of space width for hybrid photoresist

Chemical trim of photoresist lines by means of a tuned overcoat material

Radiation sensitive silicon-containing negative resists and use thereof

Approach to formulating irradiation sensitive positive resists

Photoresist system and process for aerial image enhancement

Electrically conductive polymeric materials and uses thereof

Electrically conductive polymeric materials and uses thereof

Silicon-containing compositions for spin-on ARC/hardmask materials

Packaged radiation sensitive coated workpiece process for making and method of storing same

Dielectric tone inversion materials

Dielectric tone inversion materials

Silicon-containing antireflective coatings including non-polymeric silsesquioxanes

Photoresist compositions and method for multiple exposures with multiple layer resist systems

Photoresist compositions and method for multiple exposures with multiple layer resist systems

High resolution imaging process using an in-situ image modifying layer

Process for forming features of 50 nm or less half-pitch with chemically amplified resist imaging

Acid scavengers for use in chemically amplified photoresists

Acid Scavengers for use in chemically amplified photoresists

Radiation sensitive silicon-containing negative resists and use thereof

Polymers and use thereof

Resist compositions comprising silyl ketals and methods of use thereof

Approach to formulating irradiation sensitive positive resists

Si-containing polymers for nano-pattern device fabrication

CHEN KUANG-JUNG

Method for removing threshold voltage adjusting layer with external acid diffusion process

Multiple exposure photolithography methods and photoresist compositions

Developable bottom antireflective coating composition and pattern forming method using thereof

Developable bottom antireflective coating compositions for negative resists

SHIPLEY CO LLC

Chemically amplified positive photoresists

Photoresist comprising blends of photoacid generators

INTERNAT BUSINESS MACHINES MAC

Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups

IBM CORP OF ARMONK

Methods for preparing photoresist compositions

SHINETSU CHEMICAL CO

Patterning process

HUANG WU-SONG

Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same

GLODDE MARTIN

Near-infrared absorbing film compositions

BURNS SEAN DAVID

Chemical trim of photoresist lines by means of a tuned overcoat

GLOBALFOUNDRIES INC

Near-infrared absorbing film compositions