Inventor
ASAKAWA Tatsuo
JP8 patents
Patents
8 patentsUS9377679B2Jun 28, 2016
Reflective mask blank and method for manufacturing same, method for manufacturing reflective mask, and method for manufacturing semiconductor device
HOYA CORP5 citations83
US9726969B2Aug 8, 2017
Reflective mask blank, method of manufacturing same, reflective mask and method of manufacturing semiconductor device
HOYA CORP2 citations72
US9720315B2Aug 1, 2017
Reflective mask blank, method of manufacturing reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP2 citations72
US10996554B2May 4, 2021
Substrate with an electrically conductive film, substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP0 citations62
US10606166B2Mar 31, 2020
Substrate with electrically conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor device
HOYA CORP1 citations62
US10191365B2Jan 29, 2019
Reflective mask blank, method of manufacturing reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP0 citations51
US9535318B2Jan 3, 2017
Reflective mask blank and method for manufacturing same, method for manufacturing reflective mask, and method for manufacturing semiconductor device
HOYA CORP0 citations51
US10347485B2Jul 9, 2019
Reflective mask blank, method for manufacturing same, reflective mask, method for manufacturing same, and method for manufacturing semiconductor device
HOYA CORP0 citations50