P

Inventor

CHEN JIAN-HONG

TW39 patents
⚠️ This page may combine multiple inventors who share the name “CHEN JIAN-HONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG

16 patents
US7235348B2Jun 26, 2007

Water soluble negative tone photoresist

TAIWAN SEMICONDUCTOR MFG38 citations92
US6905621B2Jun 14, 2005

Method for preventing the etch transfer of sidelobes in contact hole patterns

TAIWAN SEMICONDUCTOR MFG52 citations92
US6900134B1May 31, 2005

Method for forming openings in a substrate using bottom antireflective coatings

TAIWAN SEMICONDUCTOR MFG28 citations92
US6488509B1Dec 3, 2002

Plug filling for dual-damascene process

TAIWAN SEMICONDUCTOR MFG49 citations92
US7524607B2Apr 28, 2009

Water soluble negative tone photoresist

TAIWAN SEMICONDUCTOR MFG28 citations91
US7033735B2Apr 25, 2006

Water soluble negative tone photoresist

TAIWAN SEMICONDUCTOR MFG16 citations91
US7117058B2Oct 3, 2006

Automatic statistical process control (SPC) chart generation apparatus and method thereof

TAIWAN SEMICONDUCTOR MFG55 citations87
US7254513B2Aug 7, 2007

Fault detection and classification (FDC) specification management apparatus and method thereof

TAIWAN SEMICONDUCTOR MFG11 citations80
US8048616B2Nov 1, 2011

Double patterning strategy for contact hole and trench in photolithography

TAIWAN SEMICONDUCTOR MFG3 citations63
US7972957B2Jul 5, 2011

Method of making openings in a layer of a semiconductor device

TAIWAN SEMICONDUCTOR MFG2 citations62
US7452822B2Nov 18, 2008

Via plug formation in dual damascene process

TAIWAN SEMICONDUCTOR MFG6 citations62
US7419771B2Sep 2, 2008

Method for forming a finely patterned resist

TAIWAN SEMICONDUCTOR MFG6 citations62
US7253112B2Aug 7, 2007

Dual damascene process

TAIWAN SEMICONDUCTOR MFG5 citations61
US7749904B2Jul 6, 2010

Method of forming a dual damascene structure

TAIWAN SEMICONDUCTOR MFG4 citations60
US7094686B2Aug 22, 2006

Contact hole printing by packing and unpacking

TAIWAN SEMICONDUCTOR MFG2 citations56
US8029969B2Oct 4, 2011

Material and method for photolithography

TAIWAN SEMICONDUCTOR MFG0 citations51

IND TECH RES INST

9 patents

XINTEC INC

3 patents

YEH HSIAO-WEI

2 patents

LIU BERNARD HAOCHIH

2 patents

TENCENT TECH SHENZHEN CO LTD

2 patents

TAIWAN SEMINCONDUCTOR MFG CO L

1 patent

HSU FENG-CHENG

1 patent

IND TECHNOLOGY RES INST EVERLI

1 patent

CHANG YAO-TSU

1 patent

WANG LON

1 patent