Inventor
MASU KAZUYA
JP28 patents
⚠️ This page may combine multiple inventors who share the name “MASU KAZUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CANON KK
14 patentsUS5753320AMay 19, 1998
Process for forming deposited film
CANON KK73 citations96
US5476547ADec 19, 1995
Gas feeding device for controlled vaporization of an organometallic compound used in deposition film formation
CANON KK56 citations96
US5180687AJan 19, 1993
Deposited film formation method utilizing selective deposition by use of alkyl aluminum hydride
CANON KK47 citations96
US5803974ASep 8, 1998
Chemical vapor deposition apparatus
CANON KK21 citations93
US5364664ANov 15, 1994
Process for non-selectively forming deposition film on a non-electron-donative surface
CANON KK38 citations93
US5779804AJul 14, 1998
Gas feeding device for controlled vaporization of an organanometallic compound used in deposition film formation
CANON KK18 citations92
US5755885AMay 26, 1998
Gas feeding device for controlled vaporization of an organometallic compound used in deposition film formation
CANON KK34 citations92
US5393699AFeb 28, 1995
Deposited film formation method utilizing selective deposition by use of alkyl aluminum hydride
CANON KK29 citations92
US5316972AMay 31, 1994
Process for forming deposited film by use of alkyl aluminum hydride and process for preparing semiconductor device
CANON KK27 citations92
US5179042AJan 12, 1993
Process for forming deposited film by use of alkyl aluminum hydride
CANON KK33 citations92
US5091210AFeb 25, 1992
Plasma CVD of aluminum films
CANON KK33 citations92
US6495461B2Dec 17, 2002
Process for forming amorphous titanium silicon nitride on substrate
CANON KK10 citations74
US5196372AMar 23, 1993
Process for forming metal deposited film containing aluminum as main component by use of alkyl hydride
CANON KK14 citations74
US5824150AOct 20, 1998
Process for forming deposited film by use of alkyl aluminum hydride
CANON KK2 citations63
(unassigned)
4 patentsUS5604153AFeb 18, 1997
Process for thin film formation
88 citations96
US5421895AJun 6, 1995
Apparatus for vaporizing liquid raw material and apparatus for forming thin film
55 citations96
US5766682AJun 16, 1998
Process for chemical vapor deposition of a liquid raw material
17 citations93
US5602424AFeb 11, 1997
Semiconductor circuit device wiring with F.C.C. structure, plane oriention (100) and aligned with the current direction
38 citations92