Inventor
WANG YANGYUAN
CN17 patents
⚠️ This page may combine multiple inventors who share the name “WANG YANGYUAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
UNIV BEIJING
7 patentsUS7618837B2Nov 17, 2009
Method for fabricating high aspect ratio MEMS device with integrated circuit on the same substrate using post-CMOS process
UNIV BEIJING13 citations82
US9171944B2Oct 27, 2015
Self-adaptive composite tunneling field effect transistor and method for fabricating the same
UNIV BEIJING3 citations61
US9508839B2Nov 29, 2016
Short-gate tunneling field effect transistor having non-uniformly doped vertical channel and fabrication method thereof
UNIV BEIJING0 citations51
US9054075B2Jun 9, 2015
Strip-shaped gate tunneling field effect transistor with double-diffusion and a preparation method thereof
UNIV BEIJING1 citations50
US8981421B2Mar 17, 2015
Strip-shaped gate-modulated tunneling field effect transistor and a preparation method thereof
UNIV BEIJING0 citations50
US9214629B2Dec 15, 2015
Resistive memory and method for fabricating the same
UNIV BEIJING0 citations49
US9490363B2Nov 8, 2016
Tunneling field effect transistor having a three-side source and fabrication method thereof
UNIV BEIJING0 citations40
HUANG RU
7 patentsUS9018968B2Apr 28, 2015
Method for testing density and location of gate dielectric layer trap of semiconductor device
HUANG RU17 citations81
US8710557B2Apr 29, 2014
MOS transistor having combined-source structure with low power consumption and method for fabricating the same
HUANG RU2 citations62
US8507959B2Aug 13, 2013
Combined-source MOS transistor with comb-shaped gate, and method for manufacturing the same
HUANG RU3 citations61
US8921174B2Dec 30, 2014
Method for fabricating complementary tunneling field effect transistor based on standard CMOS IC process
HUANG RU3 citations60
US8895980B2Nov 25, 2014
Tunneling current amplification transistor
HUANG RU0 citations51
US8866507B2Oct 21, 2014
Method for testing trap density of gate dielectric layer in semiconductor device having no substrate contact
HUANG RU1 citations49
US9099500B2Aug 4, 2015
Programmable array of silicon nanowire field effect transistor and method for fabricating the same
HUANG RU0 citations39