Inventor

TAMAOKI NAOKI

JP11 patents

⚠️ This page may combine multiple inventors who share the name “TAMAOKI NAOKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOSHIBA KK

4 patents

US6022806AFeb 8, 2000

Method of forming a film in recess by vapor phase growth

TOSHIBA KK29 citations88

US6365231B2Apr 2, 2002

Ammonium halide eliminator, chemical vapor deposition system and chemical vapor deposition process

TOSHIBA KK19 citations84

US5926402AJul 20, 1999

Simulation method with respect to trace object that event occurs in proportion to probability and computer program product for causing computer system to perform the simulation

TOSHIBA KK13 citations71

US7942974B2May 17, 2011

Method of cleaning a film-forming apparatus

TOSHIBA KK0 citations48

UI AKIO

2 patents

US8821684B2Sep 2, 2014

Substrate plasma processing apparatus and plasma processing method

UI AKIO52 citations92

US8252193B2Aug 28, 2012

Plasma processing apparatus of substrate and plasma processing method thereof

UI AKIO1 citations51

TOSHIBA MEMORY CORP

2 patents

US10460050B2Oct 29, 2019

Topography simulation apparatus, topography simulation method, and topography simulation program

TOSHIBA MEMORY CORP0 citations51

US9996639B2Jun 12, 2018

Topography simulation apparatus, topography simulation method and recording medium

TOSHIBA MEMORY CORP0 citations40

AIR LIQUIDE

1 patent

US7192626B2Mar 20, 2007

Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition

AIR LIQUIDE115 citations97

ICHIKAWA TAKASHI

1 patent

US8209155B2Jun 26, 2012

Simulation method and simulation program

ICHIKAWA TAKASHI5 citations61

TAMAOKI NAOKI

1 patent

US8548787B2Oct 1, 2013

Simulating a chemical reaction phenomenon in a semiconductor process

TAMAOKI NAOKI2 citations56