Inventor

LI LEPING

US94 patents

⚠️ This page may combine multiple inventors who share the name “LI LEPING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LI LEPING

IBM

In-situ monitoring of the change in thickness of films

In-situ monitoring and control of conductive films by detecting changes in induced eddy currents

In-situ monitoring of the change in thickness of films

In-situ monitoring of conductive films on semiconductor wafers

Endpoint detection for chemical mechanical polishing using frequency or amplitude mode

Indirect endpoint detection by chemical reaction and chemiluminescence

Chemical mechanical polishing endpoint process control

Interferometer for in situ measurement of thin film thickness changes

Real-time control of chemical-mechanical polishing processes using a shaft distortion measurement

Chemical mechanical polishing endpoint process control

Endpoint detection by chemical reaction and reagent

Real time measurement of etch rate during a chemical etching process

Chemical etch monitor for measuring film etching uniformity during a chemical etching process

Minimizing overetch during a chemical etching process

Method and apparatus for contactless real-time in-situ monitoring of a chemical etching process

Method and apparatus for contactless real-time in-situ monitoring of a chemical etching process

Method and apparatus for real-time, in-situ endpoint detection and closed loop etch process control

In situ, non-destructive CVD surface monitor

Method and apparatus for real-time film surface detection for large area wafers

Contactless real-time in-situ monitoring of a chemical etching process

Real time measurement of etch rate during a chemical etching process

Contactless real-time in-situ monitoring of a chemical etching

Rotary signal coupling for chemical mechanical polishing endpoint detection with a strasbaugh tool

Rotary signal coupling for chemical mechanical polishing endpoint detection with a westech tool

Optimization of chemical mechanical process by detection of oxide/nitride interface using CLD system

Apparatus for contactless real-time in-situ monitoring of a chemical etching process

Method for contactless real-time in-situ monitoring of a chemical etching process

Fixture for in-situ noncontact monitoring of wet chemical etching with passive wafer restraint

Method for detecting CMP endpoint in acidic slurries

Optimization of CMP process by detecting of oxide/nitride interface using IR system

Endpoint detection by chemical reaction and photoionization

Endpoint detection by chemical reaction

Indirect endpoint detection by chemical reaction

Real time measurement of etch rate during a chemical etching process

Measuring film etching uniformity during a chemical etching process

ABBOTT LAB

9-deoxotaxane compounds

6-O-substituted erythromycin compounds and method for making same

6,11-bridged erythromycin derivatives

Process for making 9-deoxotaxane compounds

Amino-lipopetide antifungal agents

AMGEN INC

LXR modulators

Piperidine derivatives

Antibacterial agents

TULARIK INC

LXR modulators

Antibacterial agents

UNIV NORTH CAROLINA

Antitumor compounds

ASSEMBLY BIOSCIENCES INC

Hepatitis B core protein modulators

PRESIDIO PHARMACEUTICALS INC

Inhibitors of HCV NS5A

ECOPHYSICS AG

Apparatus for detecting CMP endpoint in acidic slurries

LI LEPING

Inhibitors of HCV NS5A