Inventor
ITO NORIHIRO
JP48 patents
⚠️ This page may combine multiple inventors who share the name “ITO NORIHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
24 patentsUS7086410B2Aug 8, 2006
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD27 citations92
US7998308B2Aug 16, 2011
Liquid processing apparatus
TOKYO ELECTRON LTD16 citations84
US7891366B2Feb 22, 2011
Liquid processing apparatus
TOKYO ELECTRON LTD10 citations84
US7793610B2Sep 14, 2010
Liquid processing apparatus
TOKYO ELECTRON LTD8 citations84
US9773687B2Sep 26, 2017
Liquid processing apparatus
TOKYO ELECTRON LTD11 citations83
US9378940B2Jun 28, 2016
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD9 citations82
US9852933B2Dec 26, 2017
Substrate processing apparatus, substrate processing method, and recording medium
TOKYO ELECTRON LTD3 citations73
US9953848B2Apr 24, 2018
Substrate liquid processing apparatus
TOKYO ELECTRON LTD6 citations72
US9478445B2Oct 25, 2016
Substrate liquid processing apparatus and method for detecting abnormality of air flow
TOKYO ELECTRON LTD2 citations63
US8371318B2Feb 12, 2013
Liquid processing apparatus, liquid processing method, and storage medium
TOKYO ELECTRON LTD2 citations63
US8051862B2Nov 8, 2011
Liquid processing apparatus and liquid processing method
TOKYO ELECTRON LTD4 citations63
US8042560B2Oct 25, 2011
Substrate processing apparatus
TOKYO ELECTRON LTD5 citations63
US7849864B2Dec 14, 2010
Liquid processing system
TOKYO ELECTRON LTD6 citations63
US10297473B2May 21, 2019
Liquid processing apparatus
TOKYO ELECTRON LTD1 citations62
US8043440B2Oct 25, 2011
Cleaning apparatus and method and computer readable medium
TOKYO ELECTRON LTD2 citations62
US10276425B2Apr 30, 2019
Substrate processing system
TOKYO ELECTRON LTD1 citations61
US11024518B2Jun 1, 2021
Substrate processing apparatus, substrate processing method and recording medium
TOKYO ELECTRON LTD0 citations52
US9768039B2Sep 19, 2017
Substrate processing apparatus
TOKYO ELECTRON LTD1 citations51
US7767006B2Aug 3, 2010
Ozone processing apparatus and ozone processing method
TOKYO ELECTRON LTD1 citations51
US7180035B2Feb 20, 2007
Substrate processing device
TOKYO ELECTRON LTD0 citations51
US11322373B2May 3, 2022
Liquid processing apparatus
TOKYO ELECTRON LTD0 citations50
US10580669B2Mar 3, 2020
Substrate processing apparatus and nozzle
TOKYO ELECTRON LTD0 citations49
US10486208B2Nov 26, 2019
Substrate processing apparatus, method of cleaning substrate processing apparatus, and storage medium
TOKYO ELECTRON LTD0 citations41
US10460962B2Oct 29, 2019
Substrate processing apparatus
TOKYO ELECTRON LTD0 citations40
ITO NORIHIRO
8 patentsUS8393227B2Mar 12, 2013
Substrate processing method, storage medium storing program for executing the same, substrate processing apparatus, and fault detection method for differential pressure flowmeter
ITO NORIHIRO11 citations82
US9711380B2Jul 18, 2017
Liquid processing apparatus, liquid processing method and storage medium
ITO NORIHIRO2 citations73
US9768010B2Sep 19, 2017
Liquid treatment apparatus
ITO NORIHIRO4 citations71
US8950414B2Feb 10, 2015
Liquid processing apparatus, liquid processing method, and storage medium
ITO NORIHIRO2 citations62
US8210190B2Jul 3, 2012
Treatment apparatus, treatment method and storage medium
ITO NORIHIRO3 citations62
US8201568B2Jun 19, 2012
Liquid treatment apparatus
ITO NORIHIRO4 citations59
US9691602B2Jun 27, 2017
Liquid process apparatus and liquid process method
ITO NORIHIRO0 citations40
US9177838B2Nov 3, 2015
Liquid process apparatus and liquid process method
ITO NORIHIRO0 citations40