Inventor · disambiguated record
Gary T. Spinillo
Also filed as: SPINILLO GARY · SPINILLO GARY T · SPINILLO GARY THOMAS
11 granted patents·471 citations·filing 1990–1998
93Inventor score
Files withIBM11
Top patents by PatentIndex Score
11 records- 0195US5607824AAntireflective coating for microlithographyIBM·Filed 1994·Granted Mar 4, 1997·61 cites·2 claims
- 0292US5482817AMid and deep-uv antireflection coatings and methods for use thereofIBM·Filed 1994·Granted Jan 9, 1996·70 cites·9 claims
- 0391US6207787B1Antireflective coating for microlithographyIBM·Filed 1998·Granted Mar 27, 2001·51 cites·7 claims
- 0490US5401614AMid and deep-UV antireflection coatings and methods for use thereofIBM·Filed 1993·Granted Mar 28, 1995·68 cites·5 claims
- 0590US5380621AMid and deep-UV antireflection coatings and methods for use thereofIBM·Filed 1993·Granted Jan 10, 1995·57 cites·7 claims
- 0688US5554485AMid and deep-UV antireflection coatings and methods for use thereofIBM·Filed 1994·Granted Sep 10, 1996·56 cites·20 claims
- 0781US5561194APhotoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyreneIBM·Filed 1995·Granted Oct 1, 1996·54 cites·19 claims
- 0875US5736301AMethod for patterning a photoresist material wherein an anti-reflective coating comprising a copolymer of bisphenol A and benzophenone is usedIBM·Filed 1996·Granted Apr 7, 1998·20 cites·3 claims
- 0963US5547812AComposition for eliminating microbridging in chemically amplified photoresists comprising a polymer blend of a poly(hydroxystyrene) and a copolymer made of hydroxystyrene and an acrylic monomerIBM·Filed 1995·Granted Aug 20, 1996·24 cites·17 claims
- 1042US5273856APositive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiationIBM·Filed 1990·Granted Dec 28, 1993·6 cites·16 claims
- 1137US5910337APhase-averaging resist coating for reflectivity controlIBM·Filed 1992·Granted Jun 8, 1999·4 cites·11 claims
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