Inventor
TODOROV VALENTIN
US8 patents
Patents
8 patentsUS6617794B2Sep 9, 2003
Method for controlling etch uniformity
APPLIED MATERIALS INC87 citations98
US6507155B1Jan 14, 2003
Inductively coupled plasma source with controllable power deposition
APPLIED MATERIALS INC106 citations97
US6706138B2Mar 16, 2004
Adjustable dual frequency voltage dividing plasma reactor
APPLIED MATERIALS INC56 citations96
US6660127B2Dec 9, 2003
Apparatus for plasma etching at a constant etch rate
APPLIED MATERIALS INC26 citations92
US6399507B1Jun 4, 2002
Stable plasma process for etching of films
APPLIED MATERIALS INC34 citations92
US6356097B1Mar 12, 2002
Capacitive probe for in situ measurement of wafer DC bias voltage
APPLIED MATERIALS INC33 citations92
US5942889AAug 24, 1999
Capacitive probe for in situ measurement of wafer DC bias voltage
APPLIED MATERIALS INC14 citations73
US7678710B2Mar 16, 2010
Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system
APPLIED MATERIALS INC7 citations72