P

Inventor

SASSIAT NICOLAS

DE13 patents
⚠️ This page may combine multiple inventors who share the name “SASSIAT NICOLAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GLOBALFOUNDRIES INC

12 patents
US9812573B1Nov 7, 2017

Semiconductor structure including a transistor having stress creating regions and method for the formation thereof

GLOBALFOUNDRIES INC7 citations82
US9960284B2May 1, 2018

Semiconductor structure including a varactor

GLOBALFOUNDRIES INC2 citations70
US9263270B2Feb 16, 2016

Method of forming a semiconductor device structure employing fluorine doping and according semiconductor device structure

GLOBALFOUNDRIES INC2 citations62
US10886419B2Jan 5, 2021

Semiconductor structure including a varactor and method for the formation thereof

GLOBALFOUNDRIES INC0 citations59
US9231045B2Jan 5, 2016

Methods for fabricating integrated circuits with polycrystalline silicon resistor structures using a replacment gate process flow, and the integrated circuits fabricated thereby

GLOBALFOUNDRIES INC1 citations52
US9620589B2Apr 11, 2017

Integrated circuits and methods of fabrication thereof

GLOBALFOUNDRIES INC0 citations51
US9460955B2Oct 4, 2016

Integrated circuits with shallow trench isolations, and methods for producing the same

GLOBALFOUNDRIES INC0 citations51
US9029214B2May 12, 2015

Integrated circuits and methods for fabricating integrated circuits with improved silicide contacts

GLOBALFOUNDRIES INC1 citations51
US8951877B2Feb 10, 2015

Transistor with embedded strain-inducing material formed in cavities based on an amorphization process and a heat treatment

GLOBALFOUNDRIES INC1 citations51
US9396950B2Jul 19, 2016

Low thermal budget schemes in semiconductor device fabrication

GLOBALFOUNDRIES INC0 citations49
US9136266B2Sep 15, 2015

Gate oxide quality for complex MOSFET devices

GLOBALFOUNDRIES INC1 citations49
US8877582B2Nov 4, 2014

Methods of inducing a desired stress in the channel region of a transistor by performing ion implantation/anneal processes on the gate electrode

GLOBALFOUNDRIES INC0 citations41

GLOBALFOUNDRIES SG PTE LTD

1 patent