Inventor
KOZHUKH JULIA
US22 patents
⚠️ This page may combine multiple inventors who share the name “KOZHUKH JULIA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC
13 patentsUS9539694B1Jan 10, 2017
Composite polishing layer chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC8 citations83
US9457449B1Oct 4, 2016
Chemical mechanical polishing pad with composite polishing layer
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC9 citations83
US10037889B1Jul 31, 2018
Cationic particle containing slurries and methods of using them for CMP of spin-on carbon films
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC4 citations73
US9630293B2Apr 25, 2017
Chemical mechanical polishing pad composite polishing layer formulation
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC2 citations70
US10625393B2Apr 21, 2020
Chemical mechanical polishing pads having offset circumferential grooves for improved removal rate and polishing uniformity
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations51
US10316218B2Jun 11, 2019
Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations49
US10221336B2Mar 5, 2019
Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations49
US10144115B2Dec 4, 2018
Method of making polishing layer for chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US10105825B2Oct 23, 2018
Method of making polishing layer for chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US10092998B2Oct 9, 2018
Method of making composite polishing layer for chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US10011002B2Jul 3, 2018
Method of making composite polishing layer for chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US9776300B2Oct 3, 2017
Chemical mechanical polishing pad and method of making same
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US9586305B2Mar 7, 2017
Chemical mechanical polishing pad and method of making same
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
ROHM & HAAS ELECT MAT
9 patentsUS10190226B2Jan 29, 2019
Reaction products of heterocyclic nitrogen compounds polyepoxides and polyhalogens
ROHM & HAAS ELECT MAT0 citations51
US9783903B2Oct 10, 2017
Additives for electroplating baths
ROHM & HAAS ELECT MAT1 citations51
US9435045B2Sep 6, 2016
Reaction products of guanidine compounds or salts thereof, polyepoxides and polyhalogens
ROHM & HAAS ELECT MAT0 citations51
US9439294B2Sep 6, 2016
Reaction products of heterocyclic nitrogen compounds polyepoxides and polyhalogens
ROHM & HAAS ELECT MAT0 citations51
US9404193B1Aug 2, 2016
Reaction products of guanidine compounds or salts thereof, polyepoxides and polyhalogens
ROHM & HAAS ELECT MAT0 citations51
US9403762B2Aug 2, 2016
Reaction products of guanidine compounds or salts thereof, polyepoxides and polyhalogens
ROHM & HAAS ELECT MAT0 citations51
US9518324B2Dec 13, 2016
Copolymers of diglycidyl ether terminated polysiloxane compounds and non-aromatic polyamines
ROHM & HAAS ELECT MAT0 citations50
US9499912B2Nov 22, 2016
Copolymers of diglycidyl ether terminated polysiloxane compounds and non-aromatic polyamines
ROHM & HAAS ELECT MAT0 citations50
US10006136B2Jun 26, 2018
Method of electroplating photoresist defined features from copper electroplating baths containing reaction products of imidazole compounds, bisepoxides and halobenzyl compounds
ROHM & HAAS ELECT MAT0 citations49