Inventor
QIAN BAINIAN
US41 patents
⚠️ This page may combine multiple inventors who share the name “QIAN BAINIAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC
27 patentsUS9484212B1Nov 1, 2016
Chemical mechanical polishing method
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC12 citations84
US9586304B2Mar 7, 2017
Controlled-expansion CMP PAD casting method
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC7 citations83
US9539694B1Jan 10, 2017
Composite polishing layer chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC8 citations83
US9457449B1Oct 4, 2016
Chemical mechanical polishing pad with composite polishing layer
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC9 citations83
US10391606B2Aug 27, 2019
Chemical mechanical polishing pads for improved removal rate and planarization
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC10 citations82
US9475168B2Oct 25, 2016
Polishing pad window
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC5 citations71
US9630293B2Apr 25, 2017
Chemical mechanical polishing pad composite polishing layer formulation
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC2 citations70
US11679531B2Jun 20, 2023
Chemical mechanical polishing pad and preparation thereof
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC2 citations68
US12491604B2Dec 9, 2025
Chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations62
US11396081B2Jul 26, 2022
Chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations62
US10464187B2Nov 5, 2019
High removal rate chemical mechanical polishing pads from amine initiated polyol containing curatives
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC1 citations60
US12447581B2Oct 21, 2025
Chemical mechanical planarization pad having polishing layer with multi-lobed embedded features
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations55
US9452507B2Sep 27, 2016
Controlled-viscosity CMP casting method
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC1 citations52
US10625393B2Apr 21, 2020
Chemical mechanical polishing pads having offset circumferential grooves for improved removal rate and polishing uniformity
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations51
US12220784B2Feb 11, 2025
Chemical mechanical polishing pad and preparation thereof
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations47
US11524390B2Dec 13, 2022
Methods of making chemical mechanical polishing layers having improved uniformity
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations47
US9446498B1Sep 20, 2016
Chemical mechanical polishing pad with window
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC1 citations44
US9481070B2Nov 1, 2016
High-stability polyurethane polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations41
US10144115B2Dec 4, 2018
Method of making polishing layer for chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US10105825B2Oct 23, 2018
Method of making polishing layer for chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US10092998B2Oct 9, 2018
Method of making composite polishing layer for chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US10011002B2Jul 3, 2018
Method of making composite polishing layer for chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US9776300B2Oct 3, 2017
Chemical mechanical polishing pad and method of making same
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US9586305B2Mar 7, 2017
Chemical mechanical polishing pad and method of making same
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US10722999B2Jul 28, 2020
High removal rate chemical mechanical polishing pads and methods of making
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations36
US9731398B2Aug 15, 2017
Polyurethane polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations35
US10875144B2Dec 29, 2020
Chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations34
ROHM & HAAS ELECT MAT
12 patentsUS9333620B2May 10, 2016
Chemical mechanical polishing pad with clear endpoint detection window
ROHM & HAAS ELECT MAT28 citations94
US9314897B2Apr 19, 2016
Chemical mechanical polishing pad with endpoint detection window
ROHM & HAAS ELECT MAT29 citations94
US9259821B2Feb 16, 2016
Chemical mechanical polishing layer formulation with conditioning tolerance
ROHM & HAAS ELECT MAT29 citations94
US9259820B2Feb 16, 2016
Chemical mechanical polishing pad with polishing layer and window
ROHM & HAAS ELECT MAT36 citations92
US8980749B1Mar 17, 2015
Method for chemical mechanical polishing silicon wafers
ROHM & HAAS ELECT MAT24 citations90
US9064806B1Jun 23, 2015
Soft and conditionable chemical mechanical polishing pad with window
ROHM & HAAS ELECT MAT13 citations82
US9102034B2Aug 11, 2015
Method of chemical mechanical polishing a substrate
ROHM & HAAS ELECT MAT8 citations81
US9144880B2Sep 29, 2015
Soft and conditionable chemical mechanical polishing pad
ROHM & HAAS ELECT MAT4 citations72
US9238296B2Jan 19, 2016
Multilayer chemical mechanical polishing pad stack with soft and conditionable polishing layer
ROHM & HAAS ELECT MAT2 citations60
US9238295B2Jan 19, 2016
Soft and conditionable chemical mechanical window polishing pad
ROHM & HAAS ELECT MAT2 citations60
US9216489B2Dec 22, 2015
Chemical mechanical polishing pad with endpoint detection window
ROHM & HAAS ELECT MAT1 citations52
US9233451B2Jan 12, 2016
Soft and conditionable chemical mechanical polishing pad stack
ROHM & HAAS ELECT MAT1 citations50