Inventor
TANAKA MAKI
JP96 patents
⚠️ This page may combine multiple inventors who share the name “TANAKA MAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
35 patentsUS6329826B1Dec 11, 2001
Method and apparatus for inspecting integrated circuit pattern
HITACHI LTD95 citations99
US6172363B1Jan 9, 2001
Method and apparatus for inspecting integrated circuit pattern
HITACHI LTD185 citations99
US6107637AAug 22, 2000
Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
HITACHI LTD147 citations99
US5986263ANov 16, 1999
Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same
HITACHI LTD164 citations99
US6587581B1Jul 1, 2003
Visual inspection method and apparatus therefor
HITACHI LTD118 citations98
US7692144B2Apr 6, 2010
Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
HITACHI LTD42 citations96
US6952492B2Oct 4, 2005
Method and apparatus for inspecting a semiconductor device
HITACHI LTD50 citations96
US6753518B2Jun 22, 2004
Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
HITACHI LTD35 citations96
US6583634B1Jun 24, 2003
Method of inspecting circuit pattern and inspecting instrument
HITACHI LTD68 citations96
US6347150B1Feb 12, 2002
Method and system for inspecting a pattern
HITACHI LTD52 citations96
US6335532B1Jan 1, 2002
Convergent charged particle beam apparatus and inspection method using same
HITACHI LTD38 citations96
US6333510B1Dec 25, 2001
Electron beam exposure or system inspection of measurement apparatus and its method and height detection apparatus
HITACHI LTD44 citations96
US6172365B1Jan 9, 2001
Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same
HITACHI LTD48 citations96
US6087673AJul 11, 2000
Method of inspecting pattern and apparatus thereof
HITACHI LTD58 citations96
US7417723B2Aug 26, 2008
Method of inspecting a semiconductor device and an apparatus thereof
HITACHI LTD10 citations93
US7329889B2Feb 12, 2008
Electron beam apparatus and method with surface height calculator and a dual projection optical unit
HITACHI LTD17 citations93
US7133550B2Nov 7, 2006
Pattern inspection method and apparatus
HITACHI LTD19 citations93
US7116816B2Oct 3, 2006
Method of inspecting a pattern and an apparatus thereof and a method of processing a specimen
HITACHI LTD41 citations93
US6975754B2Dec 13, 2005
Circuit pattern inspection method and apparatus
HITACHI LTD19 citations93
US6919577B2Jul 19, 2005
Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
HITACHI LTD25 citations93
US6909930B2Jun 21, 2005
Method and system for monitoring a semiconductor device manufacturing process
HITACHI LTD52 citations93
US6898305B2May 24, 2005
Circuit pattern inspection method and apparatus
HITACHI LTD40 citations93
US6841403B2Jan 11, 2005
Method for manufacturing semiconductor devices and method and its apparatus for processing detected defect data
HITACHI LTD35 citations93
US6797526B2Sep 28, 2004
Method for manufacturing semiconductor devices and method and its apparatus for processing detected defect data
HITACHI LTD23 citations93
US6717142B2Apr 6, 2004
Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same
HITACHI LTD16 citations93
US6559459B2May 6, 2003
Convergent charged particle beam apparatus and inspection method using same
HITACHI LTD14 citations93
US6373054B2Apr 16, 2002
Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same
HITACHI LTD23 citations93
US7417444B2Aug 26, 2008
Method and apparatus for inspecting integrated circuit pattern
HITACHI LTD25 citations92
US7269280B2Sep 11, 2007
Method and its apparatus for inspecting a pattern
HITACHI LTD22 citations92
US7026830B2Apr 11, 2006
Method and apparatus for inspecting integrated circuit pattern
HITACHI LTD19 citations92
US6703850B2Mar 9, 2004
Method of inspecting circuit pattern and inspecting instrument
HITACHI LTD37 citations92
US6559663B2May 6, 2003
Method and apparatus for inspecting integrated circuit pattern
HITACHI LTD20 citations92
US6236057B1May 22, 2001
Method of inspecting pattern and apparatus thereof with a differential brightness image detection
HITACHI LTD15 citations92
US7952074B2May 31, 2011
Method and apparatus for inspecting integrated circuit pattern
HITACHI LTD8 citations84
US7266235B2Sep 4, 2007
Pattern inspection method and apparatus
HITACHI LTD10 citations84
HITACHI HIGH TECH CORP
12 patentsUS7164128B2Jan 16, 2007
Method and apparatus for observing a specimen
HITACHI HIGH TECH CORP26 citations93
US7061602B2Jun 13, 2006
Method of inspecting a semiconductor device and an apparatus thereof
HITACHI HIGH TECH CORP18 citations93
US7633061B2Dec 15, 2009
Method and apparatus for measuring pattern dimensions
HITACHI HIGH TECH CORP25 citations92
US6929892B2Aug 16, 2005
Method of monitoring an exposure process
HITACHI HIGH TECH CORP25 citations92
US6913861B2Jul 5, 2005
Method of observing exposure condition for exposing semiconductor device and its apparatus and method of manufacturing semiconductor device
HITACHI HIGH TECH CORP24 citations92
US9852881B2Dec 26, 2017
Scanning electron microscope system, pattern measurement method using same, and scanning electron microscope
HITACHI HIGH TECH CORP9 citations84
US7935927B2May 3, 2011
Method and apparatus for observing a specimen
HITACHI HIGH TECH CORP7 citations84
US7889908B2Feb 15, 2011
Method and apparatus for measuring shape of a specimen
HITACHI HIGH TECH CORP7 citations84
US7732761B2Jun 8, 2010
Method for measuring a pattern dimension using a scanning electron microscope
HITACHI HIGH TECH CORP18 citations84
US7365325B2Apr 29, 2008
Method and apparatus for observing a specimen
HITACHI HIGH TECH CORP11 citations84
US7335881B2Feb 26, 2008
Method of measuring dimensions of pattern
HITACHI HIGH TECH CORP13 citations84
US7216311B2May 8, 2007
System and method for evaluating a semiconductor device pattern, method for controlling process of forming a semiconductor device pattern and method for monitoring a semiconductor device manufacturing process
HITACHI HIGH TECH CORP11 citations84
HITACHI HIGH TECH ELECT ENG CO
1 patentWATANABE MASAHIRO
1 patentRENESAS TECH CORP
1 patentShowing the top 50 of 96 patents by PatentIndex Score.