Inventor
PRASAD ABANESHWAR
US19 patents
⚠️ This page may combine multiple inventors who share the name “PRASAD ABANESHWAR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CABOT MICROELECTRONICS CORP
16 patentsUS6913517B2Jul 5, 2005
Microporous polishing pads
CABOT MICROELECTRONICS CORP89 citations99
US6884156B2Apr 26, 2005
Multi-layer polishing pad material for CMP
CABOT MICROELECTRONICS CORP77 citations97
US6935931B2Aug 30, 2005
Microporous polishing pads
CABOT MICROELECTRONICS CORP44 citations96
US7699684B2Apr 20, 2010
CMP porous pad with component-filled pores
CABOT MICROELECTRONICS CORP36 citations92
US7435165B2Oct 14, 2008
Transparent microporous materials for CMP
CABOT MICROELECTRONICS CORP40 citations92
US7435161B2Oct 14, 2008
Multi-layer polishing pad material for CMP
CABOT MICROELECTRONICS CORP31 citations92
US7311862B2Dec 25, 2007
Method for manufacturing microporous CMP materials having controlled pore size
CABOT MICROELECTRONICS CORP34 citations92
US7267607B2Sep 11, 2007
Transparent microporous materials for CMP
CABOT MICROELECTRONICS CORP37 citations92
US7264641B2Sep 4, 2007
Polishing pad comprising biodegradable polymer
CABOT MICROELECTRONICS CORP38 citations92
US7204742B2Apr 17, 2007
Polishing pad comprising hydrophobic region and endpoint detection port
CABOT MICROELECTRONICS CORP31 citations92
US7195544B2Mar 27, 2007
CMP porous pad with component-filled pores
CABOT MICROELECTRONICS CORP29 citations92
US7059936B2Jun 13, 2006
Low surface energy CMP pad
CABOT MICROELECTRONICS CORP23 citations92
US6998166B2Feb 14, 2006
Polishing pad with oriented pore structure
CABOT MICROELECTRONICS CORP42 citations92
US6960120B2Nov 1, 2005
CMP pad with composite transparent window
CABOT MICROELECTRONICS CORP28 citations92
US6899598B2May 31, 2005
Microporous polishing pads
CABOT MICROELECTRONICS CORP14 citations92
US7686994B2Mar 30, 2010
Method of preparing a conductive film
CABOT MICROELECTRONICS CORP2 citations62