Inventor

GRUNER TORALF

DE129 patents

⚠️ This page may combine multiple inventors who share the name “GRUNER TORALF”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GRUNER TORALF

ZEISS CARL SMT GMBH

Catadioptric projection objective comprising deflection mirrors and projection exposure method

Optical system

Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system

Method and device for the correction of imaging defects

Projection exposure method and projection lens with setting of the pupil transmission

Projection exposure apparatus for microlithography comprising an optical distance measurement system

Catadioptric projection objective comprising deflection mirrors and projection exposure method

Mirror, in particular for a microlithographic projection exposure apparatus

Mirror, in particular for a microlithographic projection exposure apparatus

Mirror, more particularly for a microlithographic projection exposure apparatus

Optical arrangement, EUV lithography apparatus and method for configuring an optical arrangement

Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography

Compensation of creep effects in an imaging device

Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element

Mirror arrangement for lithography exposure apparatus and optical system comprising mirror arrangement

Microlithographic projection exposure apparatus and method of correcting optical wavefront deformations in such an apparatus

Projection exposure method and projection lens with setting of the pupil transmission

Projection exposure apparatus for semiconductor lithography

Facet assembly for a facet mirror

Mirror, in particular for a microlithographic projection exposure system

Optical module with an anticollision device for module components

Optical element, and method for correcting the wavefront effect of an optical element

ZEISS CARL SMT AG

Microlithographic exposure method as well as a projection exposure system for carrying out the method

Projection objective for immersion lithography

Objective with fluoride crystal lenses

Optical system for ultraviolet light

Microlithographic exposure method as well as a projection exposure system for carrying out the method

Projection exposure system

Projection exposure apparatus

Device for adjusting the illumination dose on a photosensitive layer

Method of determining lens materials for a projection exposure apparatus

Projection lens system of a microlithographic projection exposure installation

Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production method

Objective with fluoride crystal lenses

Optical system of a microlithographic projection exposure apparatus

Device for holding a beam splitter element

Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method

Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method

Method of manufacturing a miniaturized device

Projection lens for a microlithographic projection exposure apparatus

Microlithographic illumination method and a projection lens for carrying out the method

EVA ERIC

Optical element and method

Optical element and method

ZEISS CARL SEMICONDUCTOR MFG

Microlithographic illumination method and a projection lens for carrying out the method

FELDMANN HEIKO

Method of manufacturing a projection objective and projection objective

TOTZECK MICHAEL

Optical system of a microlithographic projection exposure apparatus

ZEISS CARL SMS GMBH

Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection

HAUF MARKUS

Optical correction device

SCHICKETANZ THOMAS

Catadioptric projection objective comprising deflection mirrors and projection exposure method

BLEIDISTEL SASCHA

Catadioptric projection objective including a reflective optical component and a measuring device