Inventor
TOUNAI KEIICHIRO
JP9 patents
⚠️ This page may combine multiple inventors who share the name “TOUNAI KEIICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NEC CORP
6 patentsUS5627083AMay 6, 1997
Method of fabricating semiconductor device including step of forming superposition error measuring patterns
NEC CORP106 citations96
US5357312AOct 18, 1994
Illuminating system in exposure apparatus for photolithography
NEC CORP47 citations91
US6403477B1Jun 11, 2002
Method for correcting an optical proximity effect in an interconnect pattern by shortening the legs of cutout patterns to avoid linewidth reduction
NEC CORP17 citations82
US6519759B2Feb 11, 2003
Photomask pattern shape correction method and corrected photomask
NEC CORP10 citations72
US5871874AFeb 16, 1999
Mask pattern forming method capable of correcting errors by proximity effect and developing process
NEC CORP9 citations72
US6174633B1Jan 16, 2001
Method for correcting photocontiguous effect during manufacture of semiconductor device
NEC CORP5 citations61
NEC ELECTRONICS CORP
2 patentsUS6570174B1May 27, 2003
Optical proximity effect correcting method in semiconductor manufacturing process, which can sufficiently correct optical proximity effect, even under various situations with regard to size and shape of design pattern, and space width and position relation between design patterns
NEC ELECTRONICS CORP40 citations92
US7058923B2Jun 6, 2006
Optical proximity effect correcting method and mask data forming method in semiconductor manufacturing process, which can sufficiently correct optical proximity effect, even under various situations with regard to size and shape of design pattern, and space width and position relation between design patterns
NEC ELECTRONICS CORP15 citations83