Inventor
KOMORI EIICHI
JP17 patents
Patents
17 patentsUS10036090B2Jul 31, 2018
Trap mechanism, exhaust system, and film formation device
TOKYO ELECTRON LTD10 citations82
US10612143B2Apr 7, 2020
Raw material gas supply apparatus and film forming apparatus
TOKYO ELECTRON LTD4 citations71
US10094019B2Oct 9, 2018
Film forming apparatus
TOKYO ELECTRON LTD4 citations71
US9390933B2Jul 12, 2016
Etching method, storage medium and etching apparatus
TOKYO ELECTRON LTD3 citations69
US12571096B2Mar 10, 2026
Raw material gas supply system and raw material gas supply method
TOKYO ELECTRON LTD1 citations63
US11965242B2Apr 23, 2024
Raw material supply apparatus and raw material supply method
TOKYO ELECTRON LTD0 citations62
US11286563B2Mar 29, 2022
Substrate processing apparatus, substrate processing system, and substrate processing method
TOKYO ELECTRON LTD1 citations61
US11506321B2Nov 22, 2022
Pipe heating device and substrate processing apparatus
TOKYO ELECTRON LTD0 citations56
US12503763B2Dec 23, 2025
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations51
US12540390B2Feb 3, 2026
Raw material supply system
TOKYO ELECTRON LTD0 citations50
US12152298B2Nov 26, 2024
Powder conveying apparatus, gas supply apparatus, and method for removing powder
TOKYO ELECTRON LTD0 citations50
US12018368B2Jun 25, 2024
Powder transfer apparatus, gas supply apparatus, and powder removal method
TOKYO ELECTRON LTD0 citations50
US10526702B2Jan 7, 2020
Film forming apparatus
TOKYO ELECTRON LTD0 citations50
US12516412B2Jan 6, 2026
Method for estimating remaining amount of solid raw material, method for forming film, device for feeding raw material gas, and device for forming film
TOKYO ELECTRON LTD0 citations49
US11306847B2Apr 19, 2022
Valve device, processing apparatus, and control method
TOKYO ELECTRON LTD0 citations49
US11193205B2Dec 7, 2021
Source material container
TOKYO ELECTRON LTD0 citations48
US11236425B2Feb 1, 2022
Method of processing substrate
TOKYO ELECTRON LTD0 citations42