P

Inventor

WASSINK ARNOUD CORNELIS

NL15 patents
⚠️ This page may combine multiple inventors who share the name “WASSINK ARNOUD CORNELIS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ASML NETHERLANDS BV

14 patents
US7868304B2Jan 11, 2011

Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby

ASML NETHERLANDS BV17 citations83
US7442948B2Oct 28, 2008

Contamination barrier and lithographic apparatus

ASML NETHERLANDS BV9 citations83
US7233010B2Jun 19, 2007

Radiation system and lithographic apparatus

ASML NETHERLANDS BV12 citations80
US7612353B2Nov 3, 2009

Lithographic apparatus, contaminant trap, and device manufacturing method

ASML NETHERLANDS BV8 citations79
US7485881B2Feb 3, 2009

Lithographic apparatus, illumination system, filter system and method for cooling a support of such a filter system

ASML NETHERLANDS BV5 citations74
US7397056B2Jul 8, 2008

Lithographic apparatus, contaminant trap, and device manufacturing method

ASML NETHERLANDS BV7 citations67
US8018572B2Sep 13, 2011

Lithographic apparatus and radiation system

ASML NETHERLANDS BV2 citations62
US7889312B2Feb 15, 2011

Apparatus comprising a rotating contaminant trap

ASML NETHERLANDS BV2 citations62
US7453071B2Nov 18, 2008

Contamination barrier and lithographic apparatus comprising same

ASML NETHERLANDS BV2 citations62
US7426018B2Sep 16, 2008

Lithographic apparatus, illumination system and filter system

ASML NETHERLANDS BV4 citations62
US7365345B2Apr 29, 2008

Lithographic apparatus, radiation system and filter system

ASML NETHERLANDS BV4 citations62
US7696492B2Apr 13, 2010

Radiation system and lithographic apparatus

ASML NETHERLANDS BV6 citations61
US7602472B2Oct 13, 2009

Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device

ASML NETHERLANDS BV2 citations61
US8018576B2Sep 13, 2011

Contamination prevention system, a lithographic apparatus, a radiation source and a method for manufacturing a device

ASML NETHERLANDS BV0 citations41

WASSINK ARNOUD CORNELIS

1 patent