Inventor
MIURA KAZUYUKI
JP20 patents
⚠️ This page may combine multiple inventors who share the name “MIURA KAZUYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
6 patentsUS11742188B2Aug 29, 2023
Substrate processing method, pressure control apparatus and substrate processing system
TOKYO ELECTRON LTD4 citations74
US10871786B2Dec 22, 2020
Substrate processing system and method of determining flow rate of gas
TOKYO ELECTRON LTD2 citations69
US10876870B2Dec 29, 2020
Method of determining flow rate of a gas in a substrate processing system
TOKYO ELECTRON LTD1 citations62
US11326914B2May 10, 2022
Flow rate measurement apparatus and method for more accurately measuring gas flow to a substrate processing system
TOKYO ELECTRON LTD0 citations50
US11585717B2Feb 21, 2023
Method for calibrating plurality of chamber pressure sensors and substrate processing system
TOKYO ELECTRON LTD0 citations47
US10801521B2Oct 13, 2020
Heating device and turbo molecular pump
TOKYO ELECTRON LTD0 citations41
FUJIKIN KK
3 patentsUS9010369B2Apr 21, 2015
Flow rate range variable type flow rate control apparatus
FUJIKIN KK8 citations83
US9921089B2Mar 20, 2018
Flow rate range variable type flow rate control apparatus
FUJIKIN KK2 citations72
US9383758B2Jul 5, 2016
Flow rate range variable type flow rate control apparatus
FUJIKIN KK4 citations72