Inventor
CHEN ANSEIME
TW10 patents
Patents
10 patentsUS6420791B1Jul 16, 2002
Alignment mark design
UNITED MICROELECTRONICS CORP111 citations97
US6323123B1Nov 27, 2001
Low-K dual damascene integration process
UNITED MICROELECTRONICS CORP71 citations96
US6080527AJun 27, 2000
Optical proximity correction of L and T shaped patterns on negative photoresist
UNITED MICROELECTRONICS CORP59 citations92
US6680252B2Jan 20, 2004
Method for planarizing barc layer in dual damascene process
UNITED MICROELECTRONICS CORP25 citations88
US6492097B1Dec 10, 2002
Process for increasing a line width window in a semiconductor process
UNITED MICROELECTRONICS CORP19 citations81
US6417096B1Jul 9, 2002
Method for avoiding photo residue in dual damascene with acid treatment
UNITED MICROELECTRONICS CORP12 citations72
US6350681B1Feb 26, 2002
Method of forming dual damascene structure
UNITED MICROELECTRONICS CORP9 citations72
US6489085B2Dec 3, 2002
Thermal reflow photolithographic process
UNITED MICROELECTRONICS CORP10 citations71
US6444410B1Sep 3, 2002
Method of improving photoresist profile
UNITED MICROELECTRONICS CORP10 citations71
US6312855B1Nov 6, 2001
Three-phase phase shift mask
UNITED MICROELECTRONICS CORP4 citations62