Inventor · disambiguated record
David R. Medeiros
Also filed as: MEDEIROS DAVID · MEDEIROS DAVID R · MEDEIROS DAVID ROBERT
64 granted patents·13 pending applications·1,827 citations·filing 1991–2025
99Inventor score
Top patents by PatentIndex Score
77 records- 0199US7049247B2Method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device madeIBM·Filed 2004·Granted May 23, 2006·558 cites·28 claims
- 0298US7393624B2Negative resists based on acid-catalyzed elimination of polar moleculesIBM·Filed 2007·Granted Jul 1, 2008·57 cites·20 claims
- 0398US6541398B2Ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device containing the sameIBM·Filed 2002·Granted Apr 1, 2003·150 cites·34 claims
- 0498US6441491B1Ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device containing the sameIBM·Filed 2001·Granted Aug 27, 2002·187 cites·25 claims
- 0597US7563558B2Negative resists based on acid-catalyzed elimination of polar moleculesIBM·Filed 2007·Granted Jul 21, 2009·34 cites·16 claims
- 0696US12268664B1Administration of benzodiazepine compositionsNEURELIS INC·Filed 2024·Granted Apr 8, 2025·3 cites·18 claims
- 0796US6806026B2Photoresist compositionIBM·Filed 2002·Granted Oct 19, 2004·62 cites·69 claims
- 0896US6730454B2Antireflective SiO-containing compositions for hardmask layerIBM·Filed 2002·Granted May 4, 2004·112 cites·11 claims
- 0995US6686124B1Multifunctional polymeric materials and use thereofIBM·Filed 2000·Granted Feb 3, 2004·67 cites·31 claims
- 1095US6420084B1Mask-making using resist having SIO bond-containing polymerIBM·Filed 2000·Granted Jul 16, 2002·83 cites·28 claims
- 1194US12337061B2Administration of benzodiazepine compositionsNEURELIS INC·Filed 2022·Granted Jun 24, 2025·2 cites·62 claims
- 1294US11241414B2Administration of benzodiazepine compositionsNEURELIS INC·Filed 2021·Granted Feb 8, 2022·2 cites·18 claims
- 1394US8530463B2Multimodal particulate formulationsCARTT STEVE·Filed 2008·Granted Sep 10, 2013·34 cites·24 claims
- 1493US12324852B2Administration of benzodiazepine compositionsNEURELIS INC·Filed 2021·Granted Jun 10, 2025·2 cites·31 claims
- 1593US11793786B2Administration of benzodiazepine compositionsNEURELIS INC·Filed 2021·Granted Oct 24, 2023·2 cites·27 claims
- 1693US7588879B2Graded spin-on organic antireflective coating for photolithographyIBM·Filed 2008·Granted Sep 15, 2009·15 cites·24 claims
- 1792US7312524B2Method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device madeIBM·Filed 2006·Granted Dec 25, 2007·23 cites·30 claims
- 1892US7300739B2Negative resists based on a acid-catalyzed elimination of polar moleculesIBM·Filed 2003·Granted Nov 27, 2007·33 cites·27 claims
- 1989US8895546B2Administration of benzodiazepine compositionsCARTT STEVE·Filed 2012·Granted Nov 25, 2014·10 cites·22 claims
- 2088US8084193B2Self-segregating multilayer imaging stack with built-in antireflective propertiesCHENG JOY·Filed 2008·Granted Dec 27, 2011·11 cites·3 claims
- 2188US6818381B2Underlayer compositions for multilayer lithographic processesIBM·Filed 2001·Granted Nov 16, 2004·21 cites·11 claims
- 2286US7709177B2Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereofIBM·Filed 2007·Granted May 4, 2010·7 cites·18 claims
- 2386US6673521B2Supercritical fluid(SCF) silylation processLNTERNAT BUSINESS MACHINES COR·Filed 2000·Granted Jan 6, 2004·27 cites·19 claims
- 2486US5258257ARadiation sensitive compositions comprising polymer having acid labile groupsSHIPLEY CO·Filed 1991·Granted Nov 2, 1993·51 cites·34 claims
- 2585US8137874B2Organic graded spin on BARC compositions for high NA lithographyGOLDFARB DARIO L·Filed 2008·Granted Mar 20, 2012·7 cites·12 claims
- 2685US7816069B2Graded spin-on organic antireflective coating for photolithographyIBM·Filed 2006·Granted Oct 19, 2010·7 cites·8 claims
- 2785US7300741B2Advanced chemically amplified resist for sub 30 nm dense feature resolutionIBM·Filed 2006·Granted Nov 27, 2007·7 cites·19 claims
- 2884US9763876B2Administration of benzodiazepine compositionsHALE BIOPHARMA VENTURES LLC·Filed 2014·Granted Sep 19, 2017·7 cites·36 claims
- 2983US7648820B2Antireflective hardmask and uses thereofIBM·Filed 2006·Granted Jan 19, 2010·7 cites·11 claims
- 3083US6509136B1Process of drying a cast polymeric film disposed on a workpieceIBM·Filed 2001·Granted Jan 21, 2003·21 cites·11 claims
- 3183US2025281394A1Administration of benzodiazepine compositionsNEURELIS INC·Filed 2025·Application pending·0 cites
- 3283US2023104144A1Administration of benzodiazepine compositionsNEURELIS INC·Filed 2022·Application pending·0 cites
- 3382US7135595B2Photoresist compositionIBM·Filed 2006·Granted Nov 14, 2006·4 cites·1 claims
- 3481US7521172B2Topcoat material and use thereof in immersion lithography processesIBM·Filed 2006·Granted Apr 21, 2009·7 cites·17 claims
- 3581US7105360B2Low temperature melt-processing of organic-inorganic hybridIBM·Filed 2002·Granted Sep 12, 2006·15 cites·26 claims
- 3678US8574953B2Low temperature melt-processing of organic-inorganic hybridDEHAVEN PATRICK W·Filed 2012·Granted Nov 5, 2013·4 cites·21 claims
- 3778US7598540B2High performance CMOS devices comprising gapped dual stressors with dielectric gap fillers, and methods of fabricating the sameIBM·Filed 2006·Granted Oct 6, 2009·6 cites·8 claims
- 3877US6927015B2Underlayer compositions for multilayer lithographic processesIBM·Filed 2004·Granted Aug 9, 2005·10 cites·5 claims
- 3976US8652762B2Organic graded spin on BARC compositions for high NA lithographyGOLDFARB DARIO L·Filed 2012·Granted Feb 18, 2014·2 cites·10 claims
- 4076US7014980B2Photoresist compositionIBM·Filed 2004·Granted Mar 21, 2006·10 cites·29 claims
- 4176US6543617B2Packaged radiation sensitive coated workpiece process for making and method of storing sameIBM·Filed 2001·Granted Apr 8, 2003·16 cites·49 claims
- 4276US5362600ARadiation sensitive compositions comprising polymer having acid labile groupsSHIPLEY CO·Filed 1993·Granted Nov 8, 1994·27 cites·19 claims
- 4375US7090963B2Process for forming features of 50 nm or less half-pitch with chemically amplified resist imagingIBM·Filed 2003·Granted Aug 15, 2006·16 cites·15 claims
- 4473US7223517B2Lithographic antireflective hardmask compositions and uses thereofIBM·Filed 2003·Granted May 29, 2007·14 cites·29 claims
- 4572US2009258865A1Administration of benzodiazepine compositionsHALE BIOPHARMA VENTURES LLC·Filed 2009·Application pending·0 cites
- 4669US7875408B2Bleachable materials for lithographyIBM·Filed 2007·Granted Jan 25, 2011·3 cites·26 claims
- 4769US7172849B2Antireflective hardmask and uses thereofIBM·Filed 2003·Granted Feb 6, 2007·10 cites·22 claims
- 4867US8323871B2Antireflective hardmask composition and a method of preparing a patterned material using sameBURNS SEAN D·Filed 2010·Granted Dec 4, 2012·2 cites·18 claims
- 4967US6689540B2Polymers and use thereofIBM·Filed 2002·Granted Feb 10, 2004·7 cites·18 claims
- 5062US7053401B2Synthesis and application of photosensitive pentacene precursor in organic thin film transistorsIBM·Filed 2002·Granted May 30, 2006·8 cites·16 claims
Showing the top 50 of 77 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →