Inventor
KOIBUCHI YUKARI
JP2 patents
Patents
2 patentsUS11487201B2Nov 1, 2022
Photosensitive resin composition, method of manufacturing pattern cured product, cured product, interlayer insulating film, cover-coat layer, surface protective film, and electronic component
HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD3 citations66
US11226560B2Jan 18, 2022
Photosensitive resin composition, cured pattern production method, cured product, interlayer insulating film, cover coat layer, surface protective layer, and electronic component
HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD2 citations62