Inventor
WU CHIA-WEI
TW46 patents
⚠️ This page may combine multiple inventors who share the name “WU CHIA-WEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
12 patentsUS10312106B2Jun 4, 2019
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10483108B2Nov 19, 2019
Semiconductor device and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11990339B2May 21, 2024
Semiconductor device and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11378882B2Jul 5, 2022
Chemical composition for tri-layer removal
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11081350B2Aug 3, 2021
Semiconductor device and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12188686B2Jan 7, 2025
Air curtain device and workpiece processing tool
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations60
US11923199B2Mar 5, 2024
Method and structure of middle layer removal
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11398380B2Jul 26, 2022
Method and structure of middle layer removal
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US10867803B2Dec 15, 2020
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10761423B2Sep 1, 2020
Chemical composition for tri-layer removal
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10658179B2May 19, 2020
Method and structure of middle layer removal
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US12002710B2Jun 4, 2024
Semiconductor structure and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
MACRONIX INT CO LTD
9 patentsUS7811890B2Oct 12, 2010
Vertical channel transistor structure and manufacturing method thereof
MACRONIX INT CO LTD35 citations92
US7442620B2Oct 28, 2008
Methods for forming a trench isolation structure with rounded corners in a silicon substrate
MACRONIX INT CO LTD9 citations83
US7889556B2Feb 15, 2011
Flash memory having insulating liners between source/drain lines and channels
MACRONIX INT CO LTD7 citations82
US7795088B2Sep 14, 2010
Method for manufacturing memory cell
MACRONIX INT CO LTD7 citations73
US7668010B2Feb 23, 2010
Flash memory having insulating liners between source/drain lines and channels
MACRONIX INT CO LTD7 citations72
US7629265B2Dec 8, 2009
Cleaning method for use in semiconductor device fabrication
MACRONIX INT CO LTD3 citations63
US7521321B2Apr 21, 2009
Method of fabricating a non-volatile semiconductor memory device
MACRONIX INT CO LTD2 citations62
US7971177B2Jun 28, 2011
Design tool for charge trapping memory using simulated programming operations
MACRONIX INT CO LTD0 citations52
US7776713B2Aug 17, 2010
Etching solution, method of surface modification of semiconductor substrate and method of forming shallow trench isolation
MACRONIX INT CO LTD0 citations50
UNITED MICROELECTRONICS CORP
9 patentsUS10490556B1Nov 26, 2019
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP8 citations81
US10608093B2Mar 31, 2020
Semiconductor device and method of forming the same
UNITED MICROELECTRONICS CORP2 citations72
US11502180B2Nov 15, 2022
Semiconductor device and method of forming the same
UNITED MICROELECTRONICS CORP0 citations61
US10658365B2May 19, 2020
Semiconductor device and method of manufacturing the same
UNITED MICROELECTRONICS CORP1 citations61
US10861855B2Dec 8, 2020
Semiconductor device and method of manufacturing the same
UNITED MICROELECTRONICS CORP0 citations51
US10332889B2Jun 25, 2019
Method of manufacturing a semiconductor device
UNITED MICROELECTRONICS CORP0 citations51
US11018049B2May 25, 2021
Manufacturing method of isolation structure
UNITED MICROELECTRONICS CORP0 citations49
US10636798B2Apr 28, 2020
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP0 citations49
US10204915B1Feb 12, 2019
Method of forming dynamic random access memory (DRAM)
UNITED MICROELECTRONICS CORP0 citations49
FUJIAN JINHUA INTEGRATED CIRCUIT CO LTD
3 patentsUS12062689B2Aug 13, 2024
Manufacturing method of capacitor structure
FUJIAN JINHUA INTEGRATED CIRCUIT CO LTD0 citations62
US11862666B2Jan 2, 2024
Capacitor structure and manufacturing method thereof
FUJIAN JINHUA INTEGRATED CIRCUIT CO LTD0 citations62
US12213303B2Jan 28, 2025
Semiconductor device and method of fabricating the same
FUJIAN JINHUA INTEGRATED CIRCUIT CO LTD0 citations53