Inventor

CHAN SHU-YEN

TW34 patents

⚠️ This page may combine multiple inventors who share the name “CHAN SHU-YEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHAN SHU-YEN

UNITED MICROELECTRONICS CORP

Buried word line structure and method of making the same

MOS device with epitaxial structure associated with source/drain region and method of forming the same

Semiconductor device and method of forming the same

Buried word line structure and method of making the same

Semiconductor device having silicon-germanium layer on fin and method for manufacturing the same

Semiconductor device and fabrication method thereof

Method for fabricating strained-silicon metal-oxide semiconductor transistors

Semiconductor structure with diffusion barrier region and manufacturing method thereof

Method of fabricating gate structure

Semiconductor device and method of forming the same

Multi-step annealing process

Semiconductor device

Semiconductor device

Semiconductor device and method of forming the same

Method for switching decoupled plasma nitridation processes of different doses

Semiconductor device having reverse U-shaped epitaxial layer and method for fabricating the same

Strained silicon channel semiconductor structure

Method for forming semiconductor device having a multi-thickness gate trench dielectric layer

Semiconductor device having a multi-thickness gate trench dielectric layer

Method of manufacturing a semiconductor device

Semiconductor device having silicon-germanium layer on fin and method for manufacturing the same

Semiconductor structure and method for slimming spacer

Method of fabricating gate structure

Method for fabricating semiconductor device

GUO TED MING-LANG

Method of fabricating a semiconductor structure

Semiconductor structure and method for slimming spacer

LU TSUO-WEN

Metal oxide semiconductor transistor and method of manufacturing the same

Method for fabricating MOS transistor

YANG CHAN-LON

Method of making strained silicon channel semiconductor structure

Semiconductor device and manufacturing method thereof

CHIEN CHIN-CHENG

Semiconductor device with lower metal layer thickness in PMOS region

Wang shao-wei

Manufacturing method for metal gate using ion implantation

LIN CHIEN-LIANG

Method for gate leakage reduction and Vt shift control and complementary metal-oxide-semiconductor device

LIAO CHIN-I

Process for manufacturing stress-providing structure and semiconductor device with such stress-providing structure