Inventor
FUKADA KEISUKE
JP11 patents
⚠️ This page may combine multiple inventors who share the name “FUKADA KEISUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHOWA DENKO KK
8 patentsUS10262863B2Apr 16, 2019
Method for manufacturing SiC epitaxial wafer by simultaneously utilizing an N-based gas and a CI-based gas, and SiC epitaxial growth apparatus
SHOWA DENKO KK2 citations72
US11427929B2Aug 30, 2022
Wafer supporting mechanism, chemical vapor deposition apparatus, and epitaxial wafer manufacturing method
SHOWA DENKO KK2 citations70
US10801128B2Oct 13, 2020
SiC epitaxial growth apparatus
SHOWA DENKO KK2 citations67
US12266693B2Apr 1, 2025
SiC epitaxial wafer, and method of manufacturing the same
SHOWA DENKO KK1 citations62
US11107892B2Aug 31, 2021
SiC epitaxial wafer and method for producing same
SHOWA DENKO KK0 citations61
US12166087B2Dec 10, 2024
SiC epitaxial wafer and method for manufacturing SIC epitaxial wafer
SHOWA DENKO KK1 citations60
US12467159B2Nov 11, 2025
P-type SiC epitaxial wafer and production method therefor
SHOWA DENKO KK0 citations59
US11424147B2Aug 23, 2022
Deposition apparatus having particular arrangement of raw material supply port, partition plate, and opening for measuring a temperature
SHOWA DENKO KK0 citations48