Inventor
MOMOZAWA AYA
JP4 patents
Patents
4 patentsUS9448478B2Sep 20, 2016
Chemically amplified positive-type photosensitive resin composition for thick-film application
TOKYO OHKA KOGYO CO LTD2 citations59
US10261415B2Apr 16, 2019
Chemically amplified positive-type photosensitive resin composition
TOKYO OHKA KOGYO CO LTD0 citations36
US10054855B2Aug 21, 2018
Chemically amplified positive-type photosensitive resin composition
TOKYO OHKA KOGYO CO LTD0 citations34
US10353291B2Jul 16, 2019
Method for forming photosensitive resin layer, method for producing photoresist pattern, and method for producing plated molded article
TOKYO OHKA KOGYO CO LTD0 citations32