Inventor
BEIQUE GENEVIEVE
US5 patents
Patents
5 patentsUS10395926B1Aug 27, 2019
Multiple patterning with mandrel cuts formed using a block mask
GLOBALFOUNDRIES INC11 citations81
US10056291B2Aug 21, 2018
Post spacer self-aligned cuts
GLOBALFOUNDRIES INC1 citations51
US10056292B2Aug 21, 2018
Self-aligned lithographic patterning
GLOBALFOUNDRIES INC0 citations51
US10802393B2Oct 13, 2020
Extreme ultraviolet (EUV) lithography mask
GLOBALFOUNDRIES INC0 citations39
US10622266B2Apr 14, 2020
Methods of identifying space within integrated circuit structure as mandrel space or non-mandrel space
GLOBALFOUNDRIES INC0 citations33