Inventor

LIU HUA-YU

US31 patents

⚠️ This page may combine multiple inventors who share the name “LIU HUA-YU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIU HUA-YU

NUMERICAL TECH INC

Microloading effect correction

System and method for correcting 3D effects in an alternating phase-shifting mask

Alternating phase shift mask design conflict resolution

Automated flow in PSM phase assignment

Using double exposure effects during phase shifting to control line end shortening

Alleviating line end shortening in transistor endcaps by extending phase shifters

Method and apparatus for allowing phase conflicts in phase shifting mask and chromeless phase edges

System and method for correcting 3D effects in an alternating phase-shifting mask

Method and apparatus for reducing incidental exposure by using a phase shifter with a variable regulator

Hybrid optical proximity correction for alternating aperture phase shifting designs

LIU HUA-YU

Pattern selection for full-chip source and mask optimization

Method of pattern selection for source and mask optimization

Selection of optimum patterns in a design layout based on diffraction signature analysis

Stereo set

Correction for flare effects in lithography system

ASML NETHERLANDS BV

System and method for creating a focus-exposure model of a lithography process

Pattern selection for full-chip source and mask optimization

Pattern selection for full-chip source and mask optimization

Correction for flare effects in lithography system

SYNOPSYS INC

System and method to determine impact of line end shortening

Simulation-based selection of evaluation points for model-based optical proximity correction

Alternating phase shift mask design conflict resolution

Cell library that can automatically avoid forbidden pitches

YE JUN

System and method for creating a focus-exposure model of a lithography process

System and method for creating a focus-exposure model of a lithography process

HEWLETT PACKARD CO

Single pass compensation for electron beam proximity effect

Method for compensating for the E-beam proximity effect

DONGFANG JINGYUAN ELECTRON LTD

Guided defect detection of integrated circuits

Dynamic updates for the inspection of integrated circuits

NUMERICAL TECHNOLOGIES

Alleviating line end shortening by extending phase shifters

CROUSE MICHAEL MATTHEW M

Lens heating aware source mask optimization for advanced lithography