Inventor
LIM KWANG-SHIN
KR13 patents
⚠️ This page may combine multiple inventors who share the name “LIM KWANG-SHIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
12 patentsUS5883060AMar 16, 1999
Cleaning compositions for wafers used in semiconductor devices
SAMSUNG ELECTRONICS CO LTD21 citations92
US7951653B1May 31, 2011
Methods of manufacturing a semiconductor device using compositions for etching copper
SAMSUNG ELECTRONICS CO LTD15 citations83
US7351667B2Apr 1, 2008
Etching solution for silicon oxide method of manufacturing a semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD10 citations83
US7311857B2Dec 25, 2007
Etching composition, method of preparing the same, method of etching an oxide film, and method of manufacturing a semiconductor device
SAMSUNG ELECTRONICS CO LTD13 citations81
US5782984AJul 21, 1998
Method for cleaning an integrated circuit device using an aqueous cleaning composition
SAMSUNG ELECTRONICS CO LTD16 citations81
US6232239B1May 15, 2001
Method for cleaning contact holes in a semiconductor device
SAMSUNG ELECTRONICS CO LTD11 citations73
US6071827AJun 6, 2000
Method for manufacturing semiconductor devices
SAMSUNG ELECTRONICS CO LTD12 citations73
US10495615B2Dec 3, 2019
Evaluation systems of block copolymer patterns
SAMSUNG ELECTRONICS CO LTD2 citations71
US6905570B2Jun 14, 2005
Apparatus for manufacturing integrated circuit device
SAMSUNG ELECTRONICS CO LTD5 citations62
US7795198B2Sep 14, 2010
Composition for removing a polymeric contaminant and method of removing a polymeric contaminant using the same
SAMSUNG ELECTRONICS CO LTD0 citations50
US7687448B2Mar 30, 2010
Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the composition
SAMSUNG ELECTRONICS CO LTD0 citations49
US7608540B2Oct 27, 2009
Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the composition
SAMSUNG ELECTRONICS CO LTD0 citations49