Inventor
KOJIMA YOSUKE
JP13 patents
⚠️ This page may combine multiple inventors who share the name “KOJIMA YOSUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
5 patentsUS7767366B2Aug 3, 2010
Photomask blank and photomask
SHINETSU CHEMICAL CO34 citations92
US8012654B2Sep 6, 2011
Photomask blank and photomask
SHINETSU CHEMICAL CO11 citations83
US8003284B2Aug 23, 2011
Photomask blank and photomask
SHINETSU CHEMICAL CO9 citations83
US8753786B2Jun 17, 2014
Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank
SHINETSU CHEMICAL CO0 citations50
US8753787B2Jun 17, 2014
Light pattern exposure method, photomask, and photomask blank
SHINETSU CHEMICAL CO0 citations40
TOPPAN PRINTING CO LTD
5 patentsUS7767367B2Aug 3, 2010
Photomask blank and photomask making method
TOPPAN PRINTING CO LTD10 citations83
US7989124B2Aug 2, 2011
Photomask blank and photomask making method
TOPPAN PRINTING CO LTD6 citations73
US7754397B2Jul 13, 2010
Phase-shift mask, manufacturing method thereof and manufacturing method of semiconductor element
TOPPAN PRINTING CO LTD2 citations60
US11187974B2Nov 30, 2021
Photomask blank, photomask, and photomask manufacturing method
TOPPAN PRINTING CO LTD0 citations44
US7632613B2Dec 15, 2009
Levenson type phase shift mask and manufacturing method thereof
TOPPAN PRINTING CO LTD0 citations37