Inventor
HUNG CHIH-CHANG
TW38 patents
⚠️ This page may combine multiple inventors who share the name “HUNG CHIH-CHANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
37 patentsUS10916477B2Feb 9, 2021
Fin field-effect transistor devices and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD10 citations85
US10468527B2Nov 5, 2019
Metal gate structure and methods of fabricating thereof
TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US9236446B2Jan 12, 2016
Barc-assisted process for planar recessing or removing of variable-height layers
TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US10854603B2Dec 1, 2020
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations82
US11855085B2Dec 26, 2023
Semiconductor structure cutting process and structures formed thereby
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11830926B2Nov 28, 2023
Semiconductor device structure with metal gate stacks
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11289480B2Mar 29, 2022
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10867998B1Dec 15, 2020
Semiconductor structure cutting process and structures formed thereby
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10756087B2Aug 25, 2020
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10461171B2Oct 29, 2019
Structure and formation method of semiconductor device with metal gate stacks
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US12094877B2Sep 17, 2024
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US12310096B2May 20, 2025
Method for fabricating semiconductor structure with cutting depth control
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12218130B2Feb 4, 2025
Semiconductor structure cutting process and structures formed thereby
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12166105B2Dec 10, 2024
Semiconductor device structure with metal gate stacks
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11728341B2Aug 15, 2023
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11721588B2Aug 8, 2023
Semiconductor structure with cutting depth control and method for fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11637206B2Apr 25, 2023
Metal gate structure and methods of fabricating thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11495501B2Nov 8, 2022
Fin field-effect transistor devices and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11444080B2Sep 13, 2022
Semiconductor structure cutting process and structures formed thereby
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11211465B2Dec 28, 2021
Semiconductor device having gate dielectric and inhibitor film over gate dielectric
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11201230B2Dec 14, 2021
Semiconductor device structure with metal gate stacks
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11145752B2Oct 12, 2021
Residue removal in metal gate cutting process
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11031290B2Jun 8, 2021
Semiconductor structure with cutting depth control and method for fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11011385B2May 18, 2021
CMP-friendly coatings for planar recessing or removing of variable-height layers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US9748109B2Aug 29, 2017
CMP-friendly coatings for planar recessing or removing of variable-height layers
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11804488B2Oct 31, 2023
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12490496B2Dec 2, 2025
Metal gate structure and methods of fabricating thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10872978B2Dec 22, 2020
Metal gate structure and methods of fabricating thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10833077B2Nov 10, 2020
Semiconductor structure cutting process and structures formed thereby
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10510854B2Dec 17, 2019
Semiconductor device having gate body and inhibitor film between conductive prelayer over gate body and conductive layer over inhibitor film
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10014382B2Jul 3, 2018
Semiconductor device with sidewall passivation and method of making
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9478431B2Oct 25, 2016
BARC-assisted process for planar recessing or removing of variable-height layers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12087639B2Sep 10, 2024
Fin field-effect transistor devices and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US11398477B2Jul 26, 2022
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US12581720B2Mar 17, 2026
Method of manufacturing a semiconductor device and a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48
US12484252B2Nov 25, 2025
Semiconductor devices and methods of manufacturing thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48
US12243872B2Mar 4, 2025
Semiconductor device structure and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48