Inventor

CHEN CHIA-JEN

TW92 patents

⚠️ This page may combine multiple inventors who share the name “CHEN CHIA-JEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHEN CHIA-JEN

TAIWAN SEMICONDUCTOR MFG CO LTD

Method of making an extreme ultraviolet pellicle

Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof

Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask

Pellicle structure and method for forming the same

Photomask including fiducial mark and method of making a semiconductor device using the photomask

Semiconductor structure cutting process and structures formed thereby

Photomask including fiducial mark and method of making semiconductor device using the photomask

Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask

Semiconductor structure cutting process and structures formed thereby

Method of making an extreme ultraviolet pellicle

Assist feature for a photolithographic process

Method of manufacturing extreme ultraviolet mask with reduced wafer neighboring effect

Method of manufacturing photo masks

Photomask and method of fabricating a photomask

Extreme ultraviolet mask with reduced wafer neighboring effect and method of manufacturing the same

Particle removing assembly and method of cleaning mask for lithography

Particle removing assembly and method of cleaning mask for lithography

Lithography mask with a black border regions and method of fabricating the same

Lithography mask with a black border region and method of fabricating the same

Method and device for cleaning substrates

EUV photo masks and manufacturing method thereof

EUV photo masks and manufacturing method thereof

Lithography mask with both transmission-type and reflective-type overlay marks and method of fabricating the same

Mask characterization methods

Lithography mask and methods

Photomask including fiducial mark and method of making a photomask

EUV mask blank and method of making EUV mask blank

Semiconductor structure cutting process and structures formed thereby

Air spacer and method of forming same

Photomask and method of fabricating a photomask

Lithography mask

EUV mask blank and method of making EUV mask blank

Air spacer and method of forming same

Semiconductor structure cutting process and structures formed thereby

TAIWAN SEMICONDUCTOR MFG

Reflective mask and method of making same

Method of forming a pattern

Multiple resist layer phase shift mask (PSM) blank and PSM formation method

Photomask and method for forming the same

Method of calibrating or exposing a lithography tool

Method for forming a hard mask for gate electrode patterning and corresponding device

LEE HSIN-CHANG

Method of fabricating a lithography mask

Reduce mask overlay error by removing film deposited on blank of mask

Method of making a lithography mask

CHEN CHIA-JEN

Mask and method for forming the mask

Sports training device

HSU PEI-CHENG

Reflective mask and method of making same

SHIH CHIA-TSUNG

Phase shift mask for extreme ultraviolet lithography and method of fabricating same

LIN JR JUNG

Structure and method for MOSFETS with high-K and metal gate structure

LIN MING-FUNG

Natural tourmaline anion fiber and filter and producing method

TAIWN SEMICONDUCTOR MFG COMPANY LTD

Pellicle mounting system and method