P

Inventor

KU SHU-YUAN

TW88 patents
⚠️ This page may combine multiple inventors who share the name “KU SHU-YUAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

48 patents
US10269787B2Apr 23, 2019

Metal gate structure cutting process

TAIWAN SEMICONDUCTOR MFG CO LTD13 citations93
US10535654B2Jan 14, 2020

Cut metal gate with slanted sidewalls

TAIWAN SEMICONDUCTOR MFG CO LTD11 citations85
US11107902B2Aug 31, 2021

Dielectric spacer to prevent contacting shorting

TAIWAN SEMICONDUCTOR MFG CO LTD8 citations84
US10510894B2Dec 17, 2019

Isolation structure having different distances to adjacent FinFET devices

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10468527B2Nov 5, 2019

Metal gate structure and methods of fabricating thereof

TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US10134604B1Nov 20, 2018

Semiconductor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US11855085B2Dec 26, 2023

Semiconductor structure cutting process and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11855179B2Dec 26, 2023

Semiconductor devices and methods of manufacturing thereof

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11830926B2Nov 28, 2023

Semiconductor device structure with metal gate stacks

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11721700B2Aug 8, 2023

Semiconductor devices and methods of manufacturing thereof

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11527443B2Dec 13, 2022

Residue-free metal gate cutting for fin-like field effect transistor

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11508582B2Nov 22, 2022

Cut metal gate processes

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11437287B2Sep 6, 2022

Transistor gates and methods of forming thereof

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11342444B2May 24, 2022

Dielectric spacer to prevent contacting shorting

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11289480B2Mar 29, 2022

Semiconductor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11264287B2Mar 1, 2022

Semiconductor device with cut metal gate and method of manufacture

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11251284B2Feb 15, 2022

Dummy gate cutting process and resulting gate structures

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US11145536B2Oct 12, 2021

Gate dielectric preserving gate cut process

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11056478B2Jul 6, 2021

Metal gate structure cutting process

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10872897B2Dec 22, 2020

Cutting metal gates in fin field effect transistors

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10867998B1Dec 15, 2020

Semiconductor structure cutting process and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10861746B2Dec 8, 2020

Method of manufacturing a semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10756087B2Aug 25, 2020

Semiconductor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10714347B2Jul 14, 2020

Cut metal gate processes

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10699940B2Jun 30, 2020

Gate dielectric preserving gate cut process

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10461171B2Oct 29, 2019

Structure and formation method of semiconductor device with metal gate stacks

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10460994B2Oct 29, 2019

Residue-free metal gate cutting for fin-like field effect transistor

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10424588B2Sep 24, 2019

Cutting metal gates in fin field effect transistors

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11996472B2May 28, 2024

Multi-layer dielectric refill for profile control in semiconductor devices

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11600718B2Mar 7, 2023

Multi-layer dielectric refill for profile control in semiconductor devices

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US12002715B2Jun 4, 2024

Semiconductor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US12302633B2May 13, 2025

Semiconductor devices and methods of manufacturing thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12261172B2Mar 25, 2025

Semiconductor devices and methods of manufacturing thereof

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations63
US12021084B2Jun 25, 2024

Semiconductor devices and methods of manufacturing thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11810909B2Nov 7, 2023

Metal gate structure cutting process

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11699758B2Jul 11, 2023

Isolation structure having different distances to adjacent FinFET devices

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11031501B2Jun 8, 2021

Isolation structure having different distances to adjacent FinFET devices

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12563803B2Feb 24, 2026

Cut metal gate processes

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12538562B2Jan 27, 2026

Method of manufacturing a semiconductor device including depositing and etching a liner multiple times

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12389664B2Aug 12, 2025

Transistor gates and methods of forming thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12382650B2Aug 5, 2025

Multi-layer dielectric refill for profile control in semiconductor devices

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12363976B2Jul 15, 2025

Semiconductor devices and methods of manufacturing thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12363994B2Jul 15, 2025

Residue-free metal gate cutting for fin-like field effect transistor

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12363999B2Jul 15, 2025

Fin field-effect transistor and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12349268B2Jul 1, 2025

Package component

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12310096B2May 20, 2025

Method for fabricating semiconductor structure with cutting depth control

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12218130B2Feb 4, 2025

Semiconductor structure cutting process and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12206011B2Jan 21, 2025

Dummy gate cutting process and resulting gate structures

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

YEH MATT

1 patent

KAO TA-WEI

1 patent

Showing the top 50 of 88 patents by PatentIndex Score.